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Polycrystalline silicon resistor, manufacturing method thereof and successive approximation analog-to-digital converter

A technology of polysilicon resistors and manufacturing methods, applied in analog/digital conversion, resistors, code conversion, etc., can solve problems such as the non-linearity of polysilicon resistance layers, improve linearity, reduce integral non-linearity, and eliminate current-carrying The effect of sub-edge effect

Pending Publication Date: 2021-09-24
CHONGQING GIGACHIP TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The inconsistency of the resistivity of the polysilicon resistive layer at the high-voltage end and the low-voltage end will cause very serious nonlinearity

Method used

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  • Polycrystalline silicon resistor, manufacturing method thereof and successive approximation analog-to-digital converter
  • Polycrystalline silicon resistor, manufacturing method thereof and successive approximation analog-to-digital converter
  • Polycrystalline silicon resistor, manufacturing method thereof and successive approximation analog-to-digital converter

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Embodiment Construction

[0042] The inventors have found that: Figure 1-Figure 2 As shown, in the current industrial successive approximation analog-to-digital converter, when the traditional polysilicon resistor is used as the voltage divider network design, a strong electric field E will be formed at the high voltage end, while the electric field at the low voltage end is weak, and the high voltage of the polysilicon resistor Carriers at the low-voltage side of the polysilicon resistor have edge-to-edge effect and the resistivity increases, while the carrier-to-edge effect on the low-voltage end of the polysilicon resistor is not obvious and the resistivity hardly increases, which makes the resistivity of the polysilicon resistor inconsistent between the high-voltage end and the low-voltage end, causing very serious problems. Non-linearity, and the nonlinearity of the resistor divider network will cause the nonlinearity of the successive approximation analog-to-digital converter; experiments have pr...

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Abstract

The invention provides a polycrystalline silicon resistor, a manufacturing method thereof and a successive approximation type analog-to-digital converter. When the polycrystalline silicon resistor is formed, an upper silicon substrate layer of a silicon-on-insulator substrate is divided into insulated and isolated substrate isolation regions by utilizing the characteristics of a silicon-on-insulator process; a silicon oxide layer and a polycrystalline silicon resistance layer are sequentially formed on an upper silicon substrate layer, the polycrystalline silicon resistance layer is divided into a plurality of polycrystalline silicon resistance blocks, and the polycrystalline silicon resistance blocks are arranged on a plurality of substrate isolation areas in a one-to-one correspondence mode, so that the potential of the substrate isolation areas tightly follows the potential of the polycrystalline silicon resistance blocks. A strong electric field cannot be formed between the polycrystalline silicon resistor block and a substrate isolation region below the polycrystalline silicon resistor block, so that a carrier edge gathering effect on the polycrystalline silicon resistor is eliminated; when the polycrystalline silicon resistor is applied to a front-end resistance voltage-dividing network of the successive approximation type analog-to-digital converter, the linearity of the resistance voltage-dividing network can be effectively improved, and the integral nonlinearity of the successive approximation type analog-to-digital converter is reduced.

Description

technical field [0001] The invention relates to the technical field of integrated circuits, in particular to a polysilicon resistor, a manufacturing method thereof, and a successive approximation analog-to-digital converter. Background technique [0002] Industrial successive approximation analog-to-digital converters (SAR ADCs) are often required to deal with voltage signal ranges of -10V to +10V, or even wider signal ranges. This requires the input signal range of the SAR ADC to reach -10V ~ +10V, but the reference voltage generated by the general integrated bandgap reference circuit is 1.25V or 2.5V, and most industrial SAR ADCs use a reference voltage of 2.5V, which is The input range of the SAR ADC signal is limited to 0-2.5V. In order to solve this problem, a resistor divider network is generally integrated in the front end of the SAR ADC, so that the signal processing range of the SAR ADC can reach ±10V. Such as figure 1 As shown, it is a typical industrial integra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L49/02H03M1/46H10N97/00
CPCH01L28/20H03M1/462H01L28/24H03M1/38H03M1/0612H03M1/124H03M1/365
Inventor 胡蓉彬
Owner CHONGQING GIGACHIP TECH CO LTD
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