5G dual-polarization base station antenna with high isolation characteristic and wide-angle scanning characteristic
A wide-angle scanning and high-isolation technology, which is applied in the directions of antenna arrays, antennas, and antenna couplings that are energized separately, can solve the problem of insufficient space for antenna units to place decoupling structures, increased antenna complexity, antenna weight, and insufficient space for placement and other issues, to achieve the effect of being suitable for mass production, simple in structure, and low in production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0045] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0046] Aiming at the problems existing in the prior art, the present invention provides a 5G dual-polarization base station antenna with high isolation characteristics and wide-angle scanning characteristics. The present invention will be described in detail below with reference to the accompanying drawings.
[0047] Ordinary technicians in the industry of the 5G base station antenna with high isolation characteristics and wide-angle scanning characteristics provided by the present invention can also use other steps to implement, figure 1 The 5G base station antenna provided by the present invention with high isolation charact...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com