Electrode coplanar LED substrate and preparation method thereof
An LED substrate and electrode technology, applied in circuits, electrical components, semiconductor devices, etc., can solve the problem of P and N electrodes on the same substrate, and achieve the effect of improving luminous efficiency and increasing light output power
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Embodiment 1
[0030] see figure 1 , the present embodiment provides an electrode coplanar LED substrate, comprising: an insulating substrate 110; a P-type lead-out electrode 112 and an N-type lead-out electrode 113 penetrating through the insulating substrate 110; The conductive adhesive layer 111. In this embodiment, the insulating substrate 110 is a high-resistance Si substrate with a thickness of 400 μm. The conductive adhesive layer 111 has a thickness of 8 μm and is made of Au. The material of the P-type lead-out electrode 112 and the N-type lead-out electrode 113 is Cu, and a metal seed layer with a thickness of 2000 Å is provided on the surface thereof, and the material of the metal seed layer is Au. The preparation method of the electrode coplanar LED substrate comprises the following steps:
[0031] (1) Take a high-resistance silicon wafer substrate 110 with a thickness of 400 microns, and use a deep silicon etching process to carve a plurality of deep holes with a depth of 120 ...
Embodiment 2
[0039] see Figure 2-5 , this embodiment provides an electrode coplanar LED chip, comprising the electrode coplanar LED substrate with the structure described in Embodiment 1 and figure 2 The LED chip of the structure shown. The structure of the LED chip is as figure 2 As shown, it includes first adhesive layer 107, columnar P electrode 109, columnar N electrode 108, insulating layer 106, P contact mirror metal and protective layer 105, P-type GaN layer 104, InGaN / GaN Multiple quantum well layer 103 , n-type GaN layer 102 , growth substrate 101 . The embedded columnar N electrode 108 radially penetrates the insulating layer 106 from top to bottom, the P-type GaN layer 104 and the InGaN / GaN multi-quantum well layer 103, and finally penetrates into the n-type GaN layer 102 and forms an ohmic contact with it; the insulating layer 106 goes deep into the Insulation protection is formed on the inner wall of the columnar N electrode 108 to the aperture; the top of the columnar P...
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Abstract
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