System and method for monitoring reaction atmosphere in chemical vapor deposition process

Abstract

The invention discloses a system for monitoring reaction atmosphere in a chemical vapor deposition process. The system comprises a chemical vapor deposition furnace, the chemical vapor deposition furnace is provided with a reaction chamber, the top of the reaction chamber is connected with a vacuum pipeline, the bottom of the reaction chamber is connected with a Zn raw material crucible, the vacuum pipeline is connected with a sample chamber through a sampling pump, the sample chamber is further connected with a dilution pipeline, a vacuum pump and a gas analyzer, one end of the vacuum pump is further connected with the vacuum pipeline, the gas analyzer, the sampling pump and the vacuum pump are all connected with a controller, and the controller is connected with a computer. The invention further discloses a monitoring method. The flow of raw material carrier gas introduced into the Zn crucible is changed by detecting the concentration of H2S or H2Se in the reaction residual gas. According to the system and the method, the consistency of the raw material ratio in the reaction space in the long-time deposition production process can be ensured, and the system is safe and reliable, so that high-quality optical materials can be produced.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition, in particular to a monitoring system and method for reaction atmosphere during chemical vapor deposition. Background technique [0002] Chemical vapor deposition technology is widely used in microelectronic devices, optoelectronic devices and surface engineering, and is one of the most important methods for preparing functional materials, structural materials and nanomaterials. The chemical vapor deposition process is very complex, including thermodynamics, chemical reaction kinetics, heat and mass transfer, etc. The description of a chemical vapor deposition system should include the temperature distribution of each point in the reactor space, the flow field distribution and the space. The type and concentration distribution of substances, etc. [0003] ZnS and ZnSe are two important infrared optical materials, and chemical vapor deposition technology is currently the mainstre...

AI Technical Summary

Problems solved by technology

Especially in long-term deposition production, if the evaporation of Zn is not adjusted in time, it will lead to delamination of the material section and seriously affect the performance of the product

In addition, during the production of ZnS (ZnSe) by chemical vapor deposition, the chemical vapor deposition furnace is a closed space, and the temperature of the crucible and the reaction chamber are relatively high, and the H 2 S(H 2 Se) gas has certain toxicity, and sealing and safety need to be considered

Images