Open type micro-focus X-ray source and control method thereof

An open, micro-focus technology, applied in the field of micro-focus, can solve the problems that the micro-focus X-ray source cannot work, the micro-focus X-ray source works under the optimal parameters, and the X-ray cannot meet the quality requirements. Effects of life extension, realization of machine learning, and reduction of debugging time

Pending Publication Date: 2021-12-14
WUXI UNICOMP TECH
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] However, with the development of micro-focus technology, the number of components included in the micro-focus X-ray source system has increased. The above-mentioned fixed parameter control may be due to external changes or changes in the internal structure of the micro-focus X-ray source, resulting in the inability to make the micro-focus X-ray source Work under the optimal parameters, and adopt the method of manual parameter adjustment, it may be due to manual operation errors that the micro-focus X-ray source cannot work under the optimal parameters, resulting in the X-ray radiation with fixed parameters not meeting the quality requirements

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  • Open type micro-focus X-ray source and control method thereof
  • Open type micro-focus X-ray source and control method thereof
  • Open type micro-focus X-ray source and control method thereof

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[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0025] The open micro-focus X-ray source and the control method of the open micro-focus X-ray source proposed by the embodiments of the present invention are described below with reference to the accompanying drawings.

[0026] figure 1 It is a schematic block diagram of an open micro-focus X-ray source according to an embodiment of the present invention, such as figure 1 As shown, the open micro-focus X-ray source includes: an open ray tube 1, a high-voltage...

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Abstract

The invention provides an open type micro-focus X-ray source and a control method thereof. The open type micro-focus X-ray source comprises an open type ray tube, wherein the open type ray tube comprises a cathode system, a deflection system and a focusing system; a high-voltage power supply system which is used for providing emission current I0, acceleration high voltage U0 and grid voltage UG for the electron beam; a vacuum system which is used for carrying out vacuumizing treatment; and a control system which is used for controlling the high-voltage power supply system to adjust the emission current I0, the acceleration high voltage U0, the deflection coil current IXY of the deflection system and the focusing coil current IF of the focusing system according to the beam spot size of the electron beam for bombarding the anode target, so that the beam spot size meets preset requirements. According to the open type micro-focus X-ray source, the input parameters can be automatically adjusted according to the change of the feedback parameters, so that the open type micro-focus X-ray source works under the optimal parameters, errors caused by manual operation are reduced, and emitted X-rays are higher in quality and better in stability.

Description

technical field [0001] The invention relates to the field of micro-focus technology, in particular to an open micro-focus X-ray source and a control method for the open micro-focus X-ray source. Background technique [0002] Micro-focus X-ray sources have very high resolution in industrial testing. At present, micro-focus X-ray sources generally use fixed parameters to directly control related systems to emit X-rays, or manually adjust the parameters of open micro-focus X-ray sources. [0003] However, with the development of micro-focus technology, the number of components included in the micro-focus X-ray source system has increased. The above-mentioned fixed parameter control may be due to external changes or changes in the internal structure of the micro-focus X-ray source, resulting in the inability to make the micro-focus X-ray source Work under the optimal parameters, but the method of manual parameter adjustment may fail to make the micro-focus X-ray source work unde...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J35/14H05G1/26
CPCH01J35/14H05G1/265H01J35/147H01J35/20H05G1/46H01J35/112H01J35/064
Inventor 仇小军孔文文张伟王刘成侯颀
Owner WUXI UNICOMP TECH
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