Quartz glass straight pipe cleaning device

Abstract

The invention provides a quartz glass straight pipe cleaning device comprising a cleaning cover, an upper end cover, a lower end cover, an upper bearing table arranged in the upper end cover, a lower bearing table arranged in the lower end cover, a first driving device, a second driving device, a lifting mechanism, an upper inner spray pipe and a lower inner spray pipe, wherein the upper end cover and the lower end cover are movably assembled together with the cleaning cover in an inserted mode, and the first driving device and the second driving device independently drive the upper bearing table and the lower bearing table to rotate synchronously. The lifting mechanism drives the upper end cover to do lifting motion, the upper inner spray pipe is vertically downwards and extends through the upper bearing table, and the lower inner spray pipe is vertically upwards and extends through the lower bearing table. The upper bearing table and the lower bearing table oppositely and movably clamp openings in the two ends of a quartz glass straight pipe in the vertical direction, and the upper inner spray pipe and the lower inner spray pipe oppositely conduct spraying to form a cylindrical spraying beam matched with an inner cavity of the quartz glass straight pipe. By means of the quartz glass straight pipe cleaning device, the rotation stability of the quartz glass straight pipe with a large length-diameter ratio in the cleaning and drying process in a vertical posture is effectively ensured, and impurities or crystal grains adhering to the inner wall surface are effectively removed.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a cleaning device for a quartz glass straight tube. Background technique [0002] Quartz tube is a semiconductor equipment consumable commonly used in semiconductor device manufacturing equipment (such as chemical vapor deposition (CVD), physical vapor deposition (PVD), diffusion equipment (Diff) or film formation equipment (T / F), etc.). After the quartz tube is used in the aforementioned semiconductor equipment for a period of time, a large amount of dirt, metal impurities or solid particles will remain on the inner wall surface. However, the quartz tube is expensive, so it needs to be reused after being thoroughly cleaned to reduce the manufacturing cost of semiconductor devices . Quartz glass straight tubes with open ends are often used in crystal growth and epitaxy of semiconductor devices and other application scenarios. During the process of crystal growth...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to disclose a cleaning device for quartz glass straight tubes, which is used to solve the problem of efficient cleaning of quartz glass straight tubes in the prior art where both ends are exposed and applied to crystal growth and epitaxy of semiconductor devices. and drying treatment to prevent the surface of the quartz glass straight tube from being scratched during the cleaning and drying process, and can adapt to the cleaning and drying requirements of quartz glass straight tubes of different sizes, effectively removing the adhesion in the semiconductor process of crystal growth and epitaxy Impurities or grains on the inner wall of the quartz glass straight tube ensure the stability of the rotation of the quartz glass straight tube with a relatively large length and diameter during the cleaning and drying process in a vertical posture

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