Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate and mask assembly

A technology of mask plate and evaporation area, applied in the field of mask plate and mask assembly, can solve the problem of affecting evaporation effect, precision metal mask plate cannot be flattened by magnetic field adsorption, and precision metal mask plate is prone to wrinkles and other problems, to achieve the effect of improving evaporation yield, uniform strain, and not easy to wrinkle

Pending Publication Date: 2022-03-01
HEFEI VISIONOX TECH CO LTD
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The precision metal mask (FMM) is a mesh structure, including the display area and the non-display area to meet the different functions of the display panel. The precision metal mask is prone to wrinkles when stretching the net, and it is easy to appear precision metal masks during evaporation. The phenomenon that the part of the mask plate cannot be absorbed and flattened by the magnetic field, thus affecting the evaporation effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate and mask assembly
  • Mask plate and mask assembly
  • Mask plate and mask assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The features and exemplary embodiments of the various aspects of the present application will be described in detail below. Many specific details are proposed in the following detailed description to provide a comprehensive understanding of the present application. However, it is apparent to those skilled in the art that the present application can be implemented in the case where some details do not require these specific details. The description of the embodiments is merely a better understanding of the present application only for examples of the examples of the present application.

[0037] It should be noted that in this article, a relationship term such as the first and second, etc. is only used to distinguish an entity or operation with another entity or an operational zone, without having to require or imply these entities or operations. There is any such practical relationship or order. Moreover, the term "comprising", "comprising" or any other variable is intended...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a mask plate and a mask assembly, the mask plate comprises an evaporation area and a peripheral area, and the evaporation area comprises at least one evaporation opening; the peripheral area comprises a solid area arranged around the evaporation area, stress release parts are arranged on the solid area, and the stress release parts surround the evaporation area and are distributed in the circumferential direction. In the mask plate, the stress release parts are formed in the peripheral area, the stress release parts reduce the volume of the stress concentration part in the entity area, and the stress release parts are distributed in the circumferential direction around the evaporation area, so that the stress of the entity area is uniformly released; the stress releasing part is formed in the peripheral area, so that the strain of the mask plate tends to be uniform during net stretching, the mask plate is not prone to wrinkling during net stretching, and therefore the evaporation yield is increased.

Description

Technical field [0001] The present application belongs to the technical field of display, and more particularly to a mask plate and a mask assembly. Background technique [0002] Organic Light-Emitting Diode, OLED display panel has the advantages of low drive voltage, active light, high viewing, high efficiency, fast response speed, so applications are increasingly wide, becoming the mainstream technology of display panels. During the preparation of the OLED display panel, a vacuum vapor deposition technique is required to form a portion of the film layer in the display panel, and a mask plate is required in vacuum vapor deposition techniques to control the position of the organic material for forming the film layer. The mask plate mainly includes a general-purpose metal mask plate (CMM) and a precision metal mask plate (FMM), and CMM is used in the vapor deposition, FMM is used to vapor deposition light-emitting layers. [0003] Precision metal mask (FMM) is a mesh structure, in...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24H10K71/166C23C14/12H10K50/10
Inventor 臧公正李文星李伟丽韩冰张继帅邱岳
Owner HEFEI VISIONOX TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products