Operation method of OTS gate tube

An operation method and a technology of a gating tube, applied in the field of micro-nano electronics, to achieve the effects of wide application, suppression of threshold drift, and reduction of threshold voltage drift

Pending Publication Date: 2022-04-05
HUAZHONG UNIV OF SCI & TECH +1
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the above defects or improvement needs of the prior art, the present invention provides an operation method of the OTS gating tube, which is us

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Operation method of OTS gate tube
  • Operation method of OTS gate tube
  • Operation method of OTS gate tube

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0034] Embodiment

[0035] In this embodiment, a pulse is applied to the two ends of the OTS gate; wherein the sulfur gating material of the OTS collection tube is GE. x TE 1-x , The material of the first electrode layer and the second electrode layer is W.

[0036] In the pulse operation method of the OTS gate tube, it is convenient to extract the threshold voltage, and the rising 500NS is lowered by 500 ns, the maximum magnitude is a triangular wave of 2.5V.

[0037] The OTS tube is continuously applied using the above-described one-way triangular pulse, and the threshold voltage corresponding to each pulse is extracted, and the average value of the threshold voltage is calculated for each pulse, and the average of 95% of the confidence interval Ci is calculated. A total of 7 acquisition points; under the action of one-way triangular pulses, the threshold voltage of the obtained OTS gate tube is shown. figure 2 Shown in figure 2 The change trend of the threshold voltage mean of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an operation method of an OTS gate tube, which belongs to the technical field of micro-nano electronics, and comprises the following steps: applying pulses to two ends of the OTS gate tube, and extracting the threshold voltage Vth of the OTS gate tube after the pulses are applied each time; if Vth continuously increases P times or Vth continuously decreases P times, a reverse pulse is applied from the next time, and the number of times the Vth increases or decreases is recounted. Bidirectional pulses are applied to the two ends of an OTS gate tube, when the number of times of operation is increased, electrons are enriched in different local defect states through a field effect corresponding to the bidirectional pulses, different electron distributions are formed, and therefore electrons are prevented from being enriched in the local defect states under unidirectional pulse operation, and threshold voltage drift is reduced; the operation method provided by the invention is an electrical operation method, the operation method is simple and controllable, the problem of threshold drift of the OTS gate tube device is effectively solved on the premise that the requirement on the gate tube preparation process is not improved, and the performance of the OTS gate tube is greatly optimized.

Description

technical field [0001] The invention belongs to the technical field of micro-nano electronics, and more specifically relates to an operation method of an OTS gating tube. Background technique [0002] The next generation of new non-volatile memory, such as phase change memory (Phase Change Memory, PCM), resistive memory and other devices, due to its extremely fast erasing and writing speed, excellent miniaturization performance, and three-dimensional stacking, has become the most Hot next-generation memory. In particular, phase change memory, as one of the most important new-generation memory technologies, has shown great promise in terms of product capacity, storage density, process size, stability, read and write performance, erasing and writing life, and device power consumption. Advantage. In addition to non-destructive reading, lifespan, non-volatility, and erasing speed, phase change memory also has competitive advantages such as multi-value storage, compatibility wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L27/24
Inventor 童浩温晋宇缪向水
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products