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77 results about "Electron distribution" patented technology

Electron distribution. [i′lek‚trän dis·trə′byü·shən] (physics) A function which gives the number of electrons per unit volume of phase space.

Method for coarsening surface of light-emitting diode (LED) with the aid of metal nanoparticles

The invention discloses a method for coarsening a surface of a light-emitting diode (LED) with the aid of metal nanoparticles, belonging to the technical field of manufacture of semiconductor optoelectronic materials and devices. The method comprises the steps: firstly, growing an LED epitaxial wafer on a semiconductor substrate, wherein the LED epitaxial wafer sequentially comprises an N-GaN film, a quantum well layer and a P-GaN layer; then depositing a layer of metal nanoparticles on the surface of the P-GaN layer with the aid of ultraviolet light in the solution of metal salts; placing the LED epitaxial wafer after being deposited with the metal nanoparticles in an etchant solution made from a certain proportion of hydrofluoric acid and oxidant; and performing wet etching with the aid of ultraviolet light. By depositing the metal nanoparticles on the N-GaN film, the electron distribution on the surface of the N-GaN film can be changed, the etching rate is increased, thereby being favorable to forming of a coarsened structure. The method disclosed by the invention is suitable for etching of different semiconductor materials and coarsening of the LED epitaxial wafer; and compared with the prior art, the cost is low, the coarsened area is large, the operation is simple, and an ideal coarsened effect can be obtained.
Owner:SHANDONG UNIV

Accurate multi-valued memory cell programming method

InactiveCN102385930ANarrow local storageSmall spatial distributionRead-only memoriesMemory cellSoftware engineering
The invention discloses an accurate multi-valued memory cell programming method. The accurate multi-valued memory cell programming method comprises the following steps of 1, applying low programming pulse voltage to a unit in an erasing state, and programming through a continuous multi-pulse ISPP method to obtain a lowest-threshold voltage programming state, 2, verifying if after programming, threshold voltage reaches verifying voltage VPV1 of first-stage programming or not, wherein if the threshold voltage reaches the verifying voltage VPV1 of the first-stage programming, the first-stage programming is stopped and last programming pulse voltage V1max of the first-stage programming is recorded, 3, carrying out ISSP-type programming, wherein the last programming pulse voltage V1max of the first-stage programming is utilized as initial voltage, 4, verifying if after programming, threshold voltage reaches verifying voltage VPV2 of second-stage programming or not, wherein if the threshold voltage reaches the verifying voltage VPV2 of the second-stage programming, the second-stage programming is stopped and last programming pulse voltage V2max of the second-stage programming is recorded, and if the threshold voltage does not reach the verifying voltage VPV2 of the second-stage programming, the second-stage programming is carried out sequentially, and 5, carrying out a process same as above until all bits are stored. After programming, narrow electron distribution is realized.
Owner:NANJING UNIV

High-reliability split-gate nonvolatile memory structure with high-speed low-voltage operation function

The invention discloses a high-reliability split-gate nonvolatile memory structure with a high-speed low-voltage operation function, which is characterized in that the structure comprises a selection transistor and a memory transistor, the selection transistor and the memory transistor share a substrate region and a source / drain doped region, the memory transistor is provided with a stack structure and information is stored in a charge storage layer below a grid region. By adopting a dual-layer or multilayer substrate made of stress silicon / germanium-silicon and by comprehensively utilizing high collision ionization rate brought by primary collision ionization of the channels of the stress silicon, high collision ionization rate brought by the introduction of a SixGel-x layer and wider transverse electron distribution produced resultantly, the programming efficiency of a split-gate structure can be greatly improved, the programming voltage is reduced, the data hold characteristic of adevice is improved and the high-reliability operation of the device is facilitated. Since the charge-trap-type split-gate memory preparation process disclosed by the invention is compatible with the traditional silicon planar complementary metal oxide semiconductor (CMOS) process, the wide application is facilitated.
Owner:宁夏储芯科技有限公司

Direct methanol fuel cell catalyst and preparation method thereof

The invention provides a direct methanol fuel cell catalyst and a preparation method thereof. The direct methanol fuel cell catalyst comprises carbon black, and fluorine and nitrogen which are doped in the carbon black, wherein the fluorine accounts for 0.1-20% of the weight of the direct methanol fuel cell catalyst and the nitrogen accounts for 0.1-20% of the weight of the direct methanol fuel cell catalyst. Compared with the conventional nitrogen-doped nonmetal oxygen reduction catalyst, the direct methanol fuel cell catalyst takes the carbon black as a carbon material which is sequentially doped with fluorine atoms and nitrogen atoms, and has the advantages as follows: firstly, the fluorine atoms and the nitrogen atoms have different electronegativity from oxygen, and the fluorine atoms have relatively large electronegativity and have a relatively strong electron-withdrawing property, so that synergy of the fluorine atoms and the nitrogen atoms can weaken the bond energy of chemical bonds between oxygen atoms in an oxygen molecule and can increase the speed rate of an oxygen reduction reaction; secondly, the synergy of the fluorine atoms and the nitrogen atoms also can affect the electron distribution of the carbon black, change the bond valence way of carbon atoms and improve the catalytic activity of the catalyst in the oxygen reduction reaction; and finally, the carbon black has low micropore content, so that the direct methanol fuel cell catalyst can facilitate transportation of reactants and is simple in preparation method and relatively low in cost.
Owner:CHANGZHOU INST OF ENERGY STORAGE MATERIALS &DEVICES

Blue light organic light-emitting device and organic light-emitting display

The invention discloses a bright light organic light-emitting device which comprises an electronic transmission layer and an organic light-emitting layer. The organic light-emitting layer is composed of blue light body materials and blue light dyestuff. A transition layer is arranged between the electronic transmission layer and the organic light-emitting layer and is composed of electron trap materials and transition layer body materials. According to the organic light-emitting device, the transition layer used for improving the electron distribution condition is arranged between the electronic transmission layer and the organic light-emitting layer, so that the balance of charge carriers is achieved, the service life of the organic light-emitting device is prolonged, the formation of excitons cannot be influenced, and efficiency cannot be influenced. According to the blue light organic light-emitting device, the transition layer used for improving the electron distribution condition is arranged between the electronic transmission layer and the organic light-emitting layer, so that the balance of charge carriers is achieved, the service life of the bright light organic light-emitting device is prolonged, the formation of excitons cannot be influenced, and efficiency cannot be influenced.
Owner:BEIJING VISIONOX TECH +1

Flower-shaped nitrogen-doped carbon-spinel type microspherical catalyst with high specific surface area as well as preparation method and application thereof

The invention discloses a flower-shaped nitrogen-doped carbon-spinel type microspherical catalyst with high specific surface area as well as a preparation method and application thereof. The method comprises the steps of mixing ethanol, ammonia water, water, tetraethyl orthosilicate and dopamine hydrochloride uniformly, centrifuging, and calcining to obtain nitrogen-doped carbon-silica particles; adding the nitrogen-doped carbon-silica particles into water, mixing uniformly, adding nitrate, urea and sodium hydroxide, and mixing uniformly to obtain mixed liquid; heating, centrifuging, and calcining to obtain the flower-shaped nitrogen-doped carbon-spinel type microspherical catalyst with high specific surface area. According to the preparation method provided by the invention, the process is simple; dopamine hydrochloride is adopted as a carbon source, thereby enabling silica microspheres to have rich porous structures and high frame strength; nitrogen doping can change the electron distribution of carbonaceous materials, thereby providing possibility for diffusion of ions to micropores. The active substances of the catalyst are spinel type species, and no noble metal is used; the catalyst has the advantages of low preparation cost, large specific surface area, rich surface active sites, strong stability, high catalytic activity, and the like.
Owner:SOUTH CHINA UNIV OF TECH

Epitaxial structure for optimizing ultraviolet light-emitting diode (LED) luminous layer and growth method of epitaxial structure

The invention provides an epitaxial structure for optimizing an ultraviolet light-emitting diode (LED) luminous layer. The epitaxial structure sequentially comprises a sapphire substrate, a high-temperature UGaN layer, an N-type GaN layer, a multi-quantum well (MQW) structure, an active region quantum-well luminous layer and a P-type GaN layer from bottom to top, wherein the active region quantum-well luminous layer comprises In<x>Ga<1-x>N/AlGaN multi-quantum wells in 3-30 periods, each In<x>Ga<1-x>N/AlGaN multi-quantum well also comprises a coverage layer in behind of a well layer, Al constituent doped in the coverage layer is gradually grown, the introduction of the Al constituent is gradually risen in a slope way, is performed at a constant speed and finally is gradually reduced in the slope way, the time and the ratio of the two gradual changing process in the slope way are same, and the amount of the Al constituent accounts for 1-60% of Al constituent in a multi-quantum barrier. By the growth method of the epitaxial structure, electron leakage can be reduced, the non-radiation recombination is reduced, the electron distribution in the quantum wells is improved, the current is uniformly extended, and the growth method is an effective method for improving the luminous efficiency of an ultraviolet LED; and meanwhile, the device has favorable luminous efficiency, and the photoelectric performance of the device is further improved.
Owner:宁波安芯美半导体有限公司

Novel F-doped g-carbon nitride photocatalytic material prepared by microwave method and application of material

The invention provides a novel F-doped g-C3N4 photocatalytic material prepared by a microwave method and the application of the novel F-doped g-C3N4 photocatalytic material. The method comprises the following steps of: preparing a body g-C3N4 material by adopting a thermal polymerization method; and carrying out microwave etching on the body g-C3N4 in a medium by using a microwave digestion instrument to form nitrogen vacancies on the surface of the body g-C3N4 material. According to the F-doped g-C3N4 material disclosed by the invention, F atoms are introduced into nitrogen vacancies and formC-F bonds with C atoms, so that electrons are distributed unevenly to form a surface polarization field, and the hole electron recombination rate of the surface of the material is reduced, and the activity of the photocatalyst is enhanced. The degradation rates of the material to diclofenac sodium, phenol and bisphenol A are 100%, 55% and 65% respectively, and are superior to those of the body g-C3N4. The material disclosed by the invention is simple in process and suitable for industrial mass production; and the photocatalytic degradation technology is applied to the field of PPCPs degradation, so that the material has very high application prospect and practical value.
Owner:北京水木宇杰环境科技有限公司

Monomolecular gene sequencing method and device

The invention provides a monomolecular gene sequencing method. The monomolecular gene sequencing method comprises the following steps: growing scattered quantum dot particles on a silicon carbide substrate; guiding tested DNA molecules to enter gaps; acquiring electron distribution of graphene by adopting a single electron electrode array, and transmitting the distribution information to a computer through the fast electronics; reestablishing the time and sinuous track information of the DNA molecules from high-speed signals output by the single electron electrode array; acquiring a system response matrix; and inverting the system response matrix, thus obtaining a vector composed of nucleotide species with sequences. The invention further provides a monomolecular gene sequencing device. The monomolecular gene sequencing device comprises a quantum dot thin film gap module, a DNA molecular movement control module, a single electron read-out module, a system response matrix calculation module and a DNA sequence estimation module. With the adoption of the monomolecular gene sequencing method and the monomolecular gene sequencing device, the sequencing precision of detection can be effectively improved, the sequencing time can be reduced, the biased error caused by gene amplification can be avoided, and the monomolecular gene sequencing method and the monomolecular gene sequencing device are particularly suitable for hand-held terminals and application occasions with high requirement on real-time property.
Owner:NANJING RAYCAN INFORMATION TECH
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