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Gas-liquid separation device for multi-station monolithic wafer cleaning machine

A gas-liquid separation device, single-chip technology, applied in the direction of using liquid separation agent, separation method, dispersed particle separation, etc., can solve the problems of blocking the gas-liquid separation device, affecting the separation effect of waste gas and waste liquid, and avoid crystallization Effect

Active Publication Date: 2022-05-13
ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Crystals will not only block the gas-liquid separation device, but also seriously affect the separation effect of the gas-liquid separation device on the subsequent waste gas and waste liquid

Method used

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  • Gas-liquid separation device for multi-station monolithic wafer cleaning machine
  • Gas-liquid separation device for multi-station monolithic wafer cleaning machine
  • Gas-liquid separation device for multi-station monolithic wafer cleaning machine

Examples

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Embodiment Construction

[0029] The present invention will be described in detail below in conjunction with the implementations shown in the drawings, but it should be noted that these implementations are not limitations of the present invention, and those of ordinary skill in the art based on the functions, methods, or structural changes made by these implementations Equivalent transformations or substitutions all fall within the protection scope of the present invention.

[0030] It should be understood that in this application the terms "central", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear" , "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Axial", "Radial", etc. indicate the orientation or positional relationship as Based on the orientation or positional relationship shown in the drawings, it is only for the convenience of describing the technical solution and simplifying the description, and does not indicate or imp...

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Abstract

The invention provides a gas-liquid separation device for a multi-station single-chip wafer cleaning machine, which comprises a separation shell with a separation cavity, a charge component for dividing the separation cavity into an inner cavity and an outer cavity is arranged in the separation shell, the charge component is used for guiding waste gas and waste liquid in the outer cavity to flow into the inner cavity, and an exhaust pipeline communicated with the inner cavity is formed at the top of the separation shell; and at least one spray head is embedded in the exhaust pipeline, and the spray head sprays reaction liquid used for combining atomized waste liquid particles in the waste gas circulating in the exhaust pipeline. According to the waste gas and waste liquid recycling device, gas-liquid separation of waste gas and waste liquid is rapidly achieved, and the moving atomized waste liquid particles in the waste gas can be subjected to a combination reaction, so that the atomized waste liquid particles are dissolved in the waste liquid to achieve recycling of the atomized waste liquid particles, the atomized waste liquid particles are fully discharged, and the recycling efficiency of the waste liquid particles is improved. In this way, atomized waste liquid particles are removed, and the phenomenon of crystallization in the cavity is avoided.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a gas-liquid separation device for a multi-station single-chip wafer cleaning machine. Background technique [0002] The single-chip wafer cleaning machine will generate waste gas and waste liquid during the wafer cleaning process. In the prior art, an extraction device is usually used to extract the waste gas and waste liquid generated by the single-chip wafer cleaning machine and discharge it into the air In the liquid separation device, the waste gas and waste liquid are separated into gas and liquid. The gas-liquid separation device disclosed in the prior art, such as the publication number CN105161442A, is difficult to quickly realize the gas-liquid separation of waste gas and waste liquid, and it is difficult to remove the atomized waste liquid particles moving in the waste gas, resulting in It is difficult to fully discharge the atomized waste liquid parti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D47/06
CPCB01D47/06
Inventor 顾雪平时新宇
Owner ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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