An ultra-high vacuum cleavage coating device and its working method

A coating device and ultra-high vacuum technology, applied in the semiconductor field, can solve the problems of difficulty in maintaining a high vacuum environment for a long time, low working efficiency of the ultra-high vacuum cleavage coating device, etc., so as to ensure uniformity and improve working efficiency. Effect
CN114498289BActive Publication Date: 2022-07-01SUZHOU EVERBRIGHT PHOTONICS CO LTD +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SUZHOU EVERBRIGHT PHOTONICS CO LTD
Publication Date
2022-07-01

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Abstract

An ultra-high vacuum cleavage coating device and a working method thereof. The ultra-high vacuum cleavage coating device comprises: a cleavage cavity; a cleavage platform; a semiconductor light-emitting device carrier; the semiconductor light-emitting device carrier comprises: a first bearing platform, The first bearing platform has a first positioning groove oppositely arranged in the first direction, and a second positioning groove oppositely arranged in the second direction; first positioning pins respectively located in the first positioning grooves; respectively located in the second positioning groove a second positioning pin in the slot; the first positioning pin is adapted to move in a first direction along the first positioning slot; the second positioning pin is adapted to move in a second direction along the second positioning slot; the first positioning pin and the second positioning pins are suitable for limiting a plurality of vertically stacked semiconductor light emitting devices dropped from the cleavage platform to the first carrying platform. The ultra-high vacuum cleavage coating device has high working efficiency and can maintain a high vacuum environment for a long time.
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Description

technical field

[0001] The invention relates to the technical field of semiconductors, in particular to an ultra-high vacuum cleavage coating device and a working method thereof. Background technique

[0002] High-power semiconductor lasers are widely used in pumping solid-state lasers, material processing, and laser medical fields. Improving optical output power, life, and reliability has always been the focus of research in the field of semiconductor lasers. Catastrophic optical mirror damage (Catastrophic Optical Mirror Degradation). , COMD for short) is an important factor affecting the optical output power and reliability of semiconductor lasers. COMD is a kind of catastrophic damage in which the laser cavity surface area absorbs the high optical radiation inside the resonator cavity, causing the temperature at that location to exceed its melting point, resulting in the melting of the cavity surface. In order to solve this problem, the method adopted in the prior art i...

Claims

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