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An ultra-high vacuum cleavage coating device and its working method

A coating device and ultra-high vacuum technology, applied in the semiconductor field, can solve the problems of difficulty in maintaining a high vacuum environment for a long time, low working efficiency of the ultra-high vacuum cleavage coating device, etc., so as to ensure uniformity and improve working efficiency. Effect

Active Publication Date: 2022-07-01
SUZHOU EVERBRIGHT PHOTONICS CO LTD +1
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  • Abstract
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  • Claims
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Problems solved by technology

[0004] Therefore, the technical problem to be solved by the present invention is that the working efficiency of the ultra-high vacuum cleavage coating device in the prior art is low and it is difficult to maintain a high vacuum environment for a long time, thereby providing an ultra-high vacuum cleavage coating device and its working method

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  • An ultra-high vacuum cleavage coating device and its working method
  • An ultra-high vacuum cleavage coating device and its working method
  • An ultra-high vacuum cleavage coating device and its working method

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Embodiment Construction

[0035] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0036] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the indicated device or element must hav...

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Abstract

An ultra-high vacuum cleavage coating device and a working method thereof. The ultra-high vacuum cleavage coating device comprises: a cleavage cavity; a cleavage platform; a semiconductor light-emitting device carrier; the semiconductor light-emitting device carrier comprises: a first bearing platform, The first bearing platform has a first positioning groove oppositely arranged in the first direction, and a second positioning groove oppositely arranged in the second direction; first positioning pins respectively located in the first positioning grooves; respectively located in the second positioning groove a second positioning pin in the slot; the first positioning pin is adapted to move in a first direction along the first positioning slot; the second positioning pin is adapted to move in a second direction along the second positioning slot; the first positioning pin and the second positioning pins are suitable for limiting a plurality of vertically stacked semiconductor light emitting devices dropped from the cleavage platform to the first carrying platform. The ultra-high vacuum cleavage coating device has high working efficiency and can maintain a high vacuum environment for a long time.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to an ultra-high vacuum cleavage coating device and a working method thereof. Background technique [0002] High-power semiconductor lasers are widely used in pumping solid-state lasers, material processing, and laser medical fields. Improving optical output power, life, and reliability has always been the focus of research in the field of semiconductor lasers. Catastrophic optical mirror damage (Catastrophic Optical Mirror Degradation). , COMD for short) is an important factor affecting the optical output power and reliability of semiconductor lasers. COMD is a kind of catastrophic damage in which the laser cavity surface area absorbs the high optical radiation inside the resonator cavity, causing the temperature at that location to exceed its melting point, resulting in the melting of the cavity surface. In order to solve this problem, the method adopted in the prior art i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/028C23C14/50
CPCH01S5/0282C23C14/505
Inventor 王俊李波胡燚文郭路安廖新胜闵大勇
Owner SUZHOU EVERBRIGHT PHOTONICS CO LTD
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