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Integrated brain electrode structure and preparation method thereof

A brain electrode and electrode technology, applied in the field of integrated brain electrode structure and its preparation, can solve the problems of large area, unfriendly experimental operation, difficulty in taking into account small size, high flexibility, etc., achieve large flux, avoid electrode structure The effect of poor adhesion

Pending Publication Date: 2022-05-20
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] What the present invention aims to solve is to solve the split-type brain electrode in the prior art, so that the rear end of the flexible cortical electrode needs to be connected to the lead wire through the FPC adapter. The FPC adapter is too close to the brain tissue and has a large area. Difficult to take into account small size, high flexibility, unfriendly to experimental surgery, etc.

Method used

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  • Integrated brain electrode structure and preparation method thereof
  • Integrated brain electrode structure and preparation method thereof
  • Integrated brain electrode structure and preparation method thereof

Examples

Experimental program
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preparation example Construction

[0071] refer to Figure 5 , Figure 5 It is a flow chart of preparation of an optional brain electrode structure in this application. On the other hand, the present application also discloses a method for preparing an integrated brain electrode structure, which includes:

[0072] 1) provide a silicon substrate 11, refer to Figure 5 Figure (a) in.

[0073] 2) Prepare a sacrificial layer 12 on the silicon substrate 11 .

[0074] Optionally, the material of the sacrificial layer 12 may be aluminum, with a thickness of 0.5-2 microns.

[0075] Optionally, in step 2), the sacrificial layer 12 (such as Figure 5 As shown in Figure (b) in ), and then graph the sacrifice, so as to obtain the Figure 5 The structure shown in panel (c) in .

[0076] 3) prepare flexible substrate layer 6 on this sacrificial layer 12, refer to Figure 5 Figure (d) in.

[0077] Optionally, the material of the flexible substrate layer 6 can be polyimide with good biocompatibility.

[0078] 4) Form...

Embodiment example 1

[0092] The brain electrode structure prepared by the above preparation method can be used for acute EEG signal acquisition, such as Figure 7 as shown, Figure 7 An optional brain electrode structure application scene diagram provided for this application. The brain electrode structure is placed on the cerebral cortex, wherein the slender connecting wire 52 can be buried under the skin until it is hung behind the ear or to the clavicle, and the pad structure 10 is connected to the lead wire 3, and the lead wire 3 is connected to the signal The acquisition device 4 is connected.

Embodiment example 2

[0094] The integrated brain electrode structure prepared according to the aforementioned manufacturing process can be implanted in the body for a long time to collect signals in the corresponding area, see Figure 8 , Figure 8 Another optional brain electrode structure application scene diagram provided for this application. The brain electrode structure is placed on the area of ​​the brain to be collected, the connection structure 8 is buried under the skull, and then connected to the pad structure 10 through the skull. The pad structure 10 can be fixed in the base of the skull, and is small and light. The pad structure 10 is connected to the lead wire 3 , and the lead wire 3 is connected to the signal acquisition device 4 .

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Abstract

The invention relates to the technical field of brain electrodes, and discloses an integrated brain electrode structure and a preparation method thereof. The integrated brain electrode structure comprises a collecting electrode structure, a connecting structure and a bonding pad structure which are connected in sequence, and the collecting electrode structure can make contact with a scalp layer and collect electroencephalogram signals; the bonding pad structure is connected with a signal acquisition device, the connecting structure is a bent structure, and the bent structure can be stretched to form a structure with the length larger than or equal to the preset length. As the connection structure is not limited by the size of the substrate in the preparation process, the connection structure has the characteristics of avoiding poor adhesion of the electrode structure easily caused by the connection between the FPC board and the rear end of the electrode structure, and having large flux.

Description

technical field [0001] The invention relates to the technical field of brain electrodes, in particular to an integrated brain electrode structure and a preparation method thereof. Background technique [0002] EEG monitoring has always played an irreplaceable role in the diagnosis and surgical positioning of brain diseases. In recent years, with the launch of the "Brain Project" worldwide, effective and high-quality EEG signal acquisition has become more and more important. It directly contributes to the decoding of brain functions and promotes a series of high-tech developments based on this, such as: brain-computer interface, neural regulation, etc. The method for collecting EEG signals mainly relies on brain electrodes. At present, there are four kinds of brain electrodes widely used: 1) scalp electroencephalogram (EEG); 2) cortical electroencephalogram (ECoG); 3) cortical microelectrodes; 4. ) depth brain electrodes (SEEG). Among them, the brain cortical planar electro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B5/291A61B5/293
CPCA61B5/291A61B5/293A61B2562/125
Inventor 陶虎周志涛徐飞鸿梁佶智
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI