Method for dissolving silicon dioxide
A silicon dioxide, initial dissolution technology, applied in the direction of chemical instruments and methods, dissolution, dissolution, etc., can solve the problems of long dissolution time, long etching time, accelerated etching rate, etc., to shorten the time, Improve the reaction time and accelerate the dissolution effect
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Embodiment 1
[0026] see figure 2 , 300g silicon dioxide containing liquid is sent to the solution tank containing an ammonia solution to carry out the initial dissolution of silicon dioxide with a ratio of 1:0.9; the silicon dioxide solution of the initial dissolution is sent to the heating tank; The hydrochloric acid is sent to In the heating tank; in the heating tank, the hydrochloric acid and the initially dissolved silicon dioxide solution are mixed, and the acid solution containing silicon dioxide is sent to the process chamber after heating for 6 minutes at a temperature of 80 °C.
Embodiment 2
[0028] 300g of silicon dioxide containing liquid is sent to the solution tank containing sodium hydroxide solution to carry out the initial dissolution of silicon dioxide in the ratio of 1:1.1; the initially dissolved silicon dioxide solution is sent to the heating tank; the phosphoric acid is sent to In the heating tank; in the heating tank, the phosphoric acid and the initially dissolved silicon dioxide solution are mixed, and the acid solution containing silicon dioxide is sent to the process chamber after heating for 6 minutes at a temperature of 160 °C.
Embodiment 3
[0030] 300g of silicon dioxide containing liquid is sent to the solution tank containing potassium hydroxide solution to carry out the initial dissolution of silicon dioxide with a ratio of 1:1.2; the initially dissolved silicon dioxide solution is sent to the heating tank; nitric acid is sent to In the heating tank; in the heating tank, the nitric acid and the initially dissolved silica solution are mixed, and the acid solution containing silica is sent to the process chamber after heating for 5 minutes at a temperature of 80 °C.
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