Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability

An interference microscope and lateral resolution technology, applied in microscopes, optics, optical components, etc., can solve the problems of high cost, limited lateral resolution, complex imaging system, etc., to improve contrast, improve lateral resolution, improve stability and The effect of anti-interference ability

Inactive Publication Date: 2007-06-27
HARBIN INST OF TECH +1
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although these methods and techniques have certain effects on improving the lateral resolution of confocal microscopes, their lateral resolution is still limited, and these imaging systems are often complex and expensive

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability
  • Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability
  • Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 2

[0031] Main parameters in embodiment two are as follows:

[0032] The reflectance of the parallel plate is R=0.04, the thickness d=5mm, and the inclination angle thereof is 5.7296°. A 40×0.7 ordinary plan achromatic microscope objective is used as the microscope objective. The angular magnification of the telescope group is M=20.

[0033] The following simulates the transverse intensity response characteristic of Embodiment 2 of the present invention to further illustrate its super-resolution capability.

[0034] Fig. 4 shows the simulation curves 17, 18 and 19 of transverse normalized intensity response of common confocal microscope, CSIM and embodiment 2 of the present invention. It can be seen from the figure that the width at half maximum (FWHW) of the central curve of the lateral response is 234nm, 145.6nm and 90nm respectively.

[0035] It can be obtained from theoretical simulation that the reflective multi-beam confocal interference microscope of the present inventi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A reflection-type multiple optical beams co-focusing and interfering microscope with high transverse resolution (tens nm) is composed of light source, collimation diffuser, the first polarized splitter, the first 1 / 4 wave plate, object lens, light-gathering lens, pinhole at the focuse position of said light-gathering lens, photoelectric detector, the second polarized splitter behind the first one, the second 1 / 4 wave plate and multi-beam generator.

Description

technical field [0001] The invention belongs to the technical field of microscopic imaging and microscopic precision measurement, and is a device for realizing lateral super-resolution imaging detection, which can be used for high-resolution microscopic imaging detection in the fields of microelectronics, materials, industrial precision detection, and biomedicine. . Background technique [0002] In recent years, with the rapid development of science and technology, semiconductor technology has developed into VLSI, millimeter wave and quantum devices, and microfabrication technology has also entered the field of deep submicron and nanometer three-dimensional processing technology. The development of high-precision optical storage technology puts forward higher and higher requirements for optical imaging system and its resolution. Therefore, it is urgent to study imaging and detection technology with super-resolution ability that meets the requirements of its development. [...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B21/00G01B9/02G01B9/04
Inventor 赵维谦冯政德
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products