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Base board transporting device, base board processing system and base board transporting method

A substrate processing system and substrate handling technology, applied in thin material processing, transportation and packaging, optics, etc., can solve the problems of high device cost, inability to detect position offset, time waste, etc.

Inactive Publication Date: 2003-03-26
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, this transfer robot can only detect positional deviations in the advancing and retreating direction of the tweezers, and cannot detect positional deviations in a direction perpendicular to the advancing and retreating direction.
Therefore, an additional sensor and a drive mechanism for adjusting the sensor at a predetermined position are provided to detect positional deviation of the substrate in a direction perpendicular to the advancing and retreating direction, but in this method, at a predetermined position, for example, while holding Positioning the sensor near the substrate with tweezers equals wasted time before setting the sensor
In addition, since it is necessary to provide a drive mechanism for moving the sensor, there are problems of necessity of space for sensor movement and high device cost.

Method used

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  • Base board transporting device, base board processing system and base board transporting method
  • Base board transporting device, base board processing system and base board transporting method
  • Base board transporting device, base board processing system and base board transporting method

Examples

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Embodiment Construction

[0040] Hereinafter, embodiments of the present invention will be described based on the drawings.

[0041] figure 1 It is a plan view showing the coating development processing system related to the first embodiment of the present invention. This coating and development processing system includes: a cassette table 1 on which a plurality of cassettes C for accommodating glass substrates G are placed; The processing section 2 of the unit; the interface section 3 for transferring the substrate G between the exposure device (not shown in the figure), and the cassette table 1 and the interface section 3 are respectively arranged at both ends of the processing section 2.

[0042] The cassette station 1 includes a transport device 10 having a articulated support arm related to the first embodiment of the present invention. The transport device 10 moves along the transport line 4 and transports the substrate G between the cassette C and the processing unit 2 . The transfer device 1...

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PUM

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Abstract

When a small pliers is pulled out to take substrate G from the cartridge C, the sensor 9 located at position P will draw a track T to move one side passing through one side(Ga) of substrate G. Thus, the position for having a perpendicular direction (Y direction) between the held substrate G and the moving forward / backward direction of small pliers 43 can be calculated from the timing of the subjected reflection light, which is obtained when the sensor 9 moves to pass through one side Ga, and the rotation pulse number of motor 6. Therefore, the shift can be detected by comparing with the timing when held at the normal position of small pliers 43.

Description

technical field [0001] The present invention relates to a substrate conveying device for conveying glass substrates used in liquid crystal displays (LCD) and the like, a substrate conveying method, and a substrate processing system such as a resist coating and developing processing system to which the substrate conveying device is applied. Background technique [0002] In the manufacturing process of LCD, in order to form ITO (Indium Tin Oxide, Indium Tin Oxide) thin film and electrode patterns on the glass substrate for LCD to be processed, the same photolithography technology as that used in semiconductor device manufacturing is used. In photolithography, a photoresist is coated on a glass substrate, exposed, and then developed. [0003] These existing series of processing procedures are carried out by an integrated coating and developing processing system. The coating and development processing system includes: a cassette stage on which a plurality of pallet cassettes co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13H01L21/00H05K13/02
CPCG02F1/13H01L21/6773H01L21/67742H01L21/68Y10S414/14
Inventor 田上真也岩崎达也大塚庆崇相良典秀熊谷典俊林伸也
Owner TOKYO ELECTRON LTD
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