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Exposure system as well as exposure method applied in color light filter

A technology of exposure system and light source, which is applied in the field of exposure system, can solve the problems of high cost of photomask, and achieve the effect of reducing production cost and size

Inactive Publication Date: 2003-05-07
INNOLUX CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the size of the substrate 16 and the substrate 26 is about 620mm×750mm, and the corresponding cost of the photomask used is quite high.

Method used

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  • Exposure system as well as exposure method applied in color light filter
  • Exposure system as well as exposure method applied in color light filter
  • Exposure system as well as exposure method applied in color light filter

Examples

Experimental program
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Embodiment Construction

[0018] see image 3 , image 3 It is a schematic diagram of the exposure system of the preferred embodiment of the present invention. Such as image 3 As shown, the exposure system 30 includes a fixed light source 31, a photomask 32 fixed below the light source 31, an arc-shaped light-receiving area 33 formed on the photomask 32 and an optical system 34 located on the photomask 32, wherein the photomask 32 has several regularly arranged openings (slit) 32a, and the optical system 34 includes a trapezoidal mirror 34a, a concave mirror (concavemirror) 34b and a convex mirror (convex mirror) ) 34c is located between the trapezoidal mirror 34a and the concave mirror 34b. The exposure system 30 also includes a stage 35 and a substrate 36 on the stage 35 , and the stage 35 is used to carry and move the substrate 36 . A beam forming optical system (not shown) is also included between the light source 31 and the photomask 32, which is used to convert the light emitted by the light...

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Abstract

This invention provides an exposure system used to expose a base plate to form several liquid crystal display panels including a light source, a light mask and a base in which the light source is used to generate optical line of a special wave length, a predesigned patter on the light mask is fixed below the light source and the base carries the base plate in a moving way so to make the predesigned pattern of the light mask transfer to different zones on the base plate in which when the pattern transfers to a place corresponding to one of the several liquid crystal display panels, the base will drive the base plate to generate a relativity shift to the light mask so as to make the predesigned pattern on it to transfer to different zones corresponding to the said liquid crystal display panel.

Description

technical field [0001] The present invention relates to an exposure system, in particular to an exposure system used in making a color filter of a liquid crystal display panel. Background technique [0002] Thin-film transistor flat-panel displays, especially thin-film transistor liquid crystal displays (hereinafter referred to as TFT-LCD), mainly use thin-film transistors arranged in a matrix to drive liquid crystal pixels with appropriate capacitors, transfer pads and other electronic components to produce rich and bright images. graphics. Because TFT-LCD has the characteristics of light and thin appearance, low power consumption and no radiation pollution, it is widely used in portable information products such as notebook computers (notebooks) and personal digital assistants (PDAs), and has even gradually The trend of CRT monitors replacing traditional desktop computers. [0003] A traditional TFT-LCD basically includes a substrate on which the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/136G03F7/20
Inventor 王俊太丁景隆
Owner INNOLUX CORP