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Method of depositing vapor phase organic matter and apparatus of depositing vapor phose organic matter using same

A technology of organic materials and deposition equipment, applied in metal material coating process, electrical components, gaseous chemical plating, etc., can solve problems such as reducing productivity, reducing the use efficiency of expensive organic materials, and inability to deposit organic semiconductor materials.

Inactive Publication Date: 2003-10-22
SNU PRECISION CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, due to the formation of organic thin films in unnecessary effective areas of vacuum equipment, the use efficiency of expensive organic materials is reduced, thereby reducing productivity.
[0005] As mentioned above, in the application of electroluminescent devices and functional thin films, when using organic thin films in vacuum deposition method to manufacture products, there are problems such as low film growth rate, low organic material usage efficiency, non-uniformity of organic thin films , the difficulty of finely adjusting the mixing amount of host material and dopant material, and the difficulty of forming a uniform organic film based on a larger substrate
In addition, there is a problem that the density of the deposited film and the adhesion to the substrate become poor
However, in the OVPD method, since one scan head is used, if at least two or more doping materials having different thermal properties are used for doping, the material may change to a material having poor thermal properties
Namely, in the two existing methods, organic semiconducting materials cannot be deposited well on wide-area substrates

Method used

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  • Method of depositing vapor phase organic matter and apparatus of depositing vapor phose organic matter using same
  • Method of depositing vapor phase organic matter and apparatus of depositing vapor phose organic matter using same
  • Method of depositing vapor phase organic matter and apparatus of depositing vapor phose organic matter using same

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no. 1 approach

[0066] Figure 2A is a plan view illustrating a vapor phase organic material deposition apparatus according to the present invention.

[0067] A gas-phase organic material deposition apparatus according to the present invention includes a deposition chamber according to the first embodiment of the present invention, an organic material chamber for heating an organic material and changing it into a gaseous state, and an operation including a spray unit for driving spraying a gas-phase organic material Auxiliary cavity for the driving device and organic material cavity.

[0068] The deposition chamber 100 according to the first embodiment of the present invention includes an inner space separated from the outside and having a structure such that a parent material 10 for depositing a vapor phase organic material is installed in a bottom surface of the inner space. In addition, the deposition chamber 100 includes: a spray unit 110, which is located on the upper part of the parent...

no. 2 approach

[0111] refer to Figure 7 A manufacturing device of an organic semiconductor device and a manufacturing method of the device that can use a wide-area substrate used when manufacturing an organic semiconductor according to the second embodiment of the present invention are described.

[0112] exist Figure 7 In the organic semiconductor system of the present invention, the vapor phase organic material deposition equipment 700 of the wide-area substrate of the second embodiment of the present invention includes: a gas storage tank 701 for storing an inert gas therein; installed in the gas storage tank 701 and MFC (mass flow Between the controller) 702, a gas heater 703 for heating the inert gas; a connecting pipe 707 installed inside the heater tube 706; at least one deposition source tank 714, which has deposited gas and organic materials in the deposition source tank; contains The scan head 709 of the deposition rate adjustment unit 715 for checking and adjusting the flow of ...

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Abstract

The present invention relates to a vapor organic material deposition method and a vapor organic material deposition apparatus using the same which are capable of fast growing a thin film uniformly on a wider substrate by spraying a vapor organic material in a gravity direction using a spraying unit installed in an upper side of the same and accurately and stably adjusting a thickness of a wider substrate of an organic thin film by using a diluting gas as a deposition material and continuously carrying a small size heat source to a scan head.

Description

field of invention [0001] The present invention relates to a gas-phase organic material deposition method and a gas-phase organic material deposition device in a semiconductor device manufacturing device and a manufacturing method of the device, in particular to such a gas-phase organic material deposition method and a gas-phase organic material deposition device using the method, The device can uniformly and rapidly grow thin films on wider substrates by spraying gas-phase organic materials in the direction of gravity using a spray unit installed above the device and by using a dilution gas as the deposition material and continuously carrying a small amount of heat source to the scanning head while precisely and stably adjusting the thickness of organic thin films on wider substrates. Background technique [0002] Recently, thin-film formation technologies using functional polymers as organic compounds and organometallic compounds have focused on conductive materials, optoe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/12C23C16/44C23C16/448C23C16/455
CPCC23C14/12C23C14/228C23C16/4481C23C16/4486C23C16/4485C23C16/45589
Inventor 金东秀裴京彬崔东权
Owner SNU PRECISION CO LTD