Method for quantifying texture homogeneity of polycrystalline material

A material, incremental technique applied to measuring devices, material analysis using radiation diffraction, instrumentation, etc., capable of solving problems such as inconsistencies in interpretation

Inactive Publication Date: 2004-02-18
CABOT CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although a visual representation of the structure of a polycrystalline material can help reveal any structural inhomogeneity in a polycrystalline material, interpretation must be performed and may vary significantly from one person to another
Moreover, a visual representation of the structure can only provide an overall idea of ​​the structural homogeneity

Method used

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  • Method for quantifying texture homogeneity of polycrystalline material
  • Method for quantifying texture homogeneity of polycrystalline material
  • Method for quantifying texture homogeneity of polycrystalline material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] This experiment was performed to illustrate the relationship between microstructure and structural inhomogeneity in a poor metallurgical quality tantalum plate. Sputter target grade wrought and recrystallized 0.25" thick tantalum plates are commercially available. Their chemical, metallurgical and mechanical properties are shown in Table 1. From about 0.5" from the sheared edge of the plate " or more area to take a sample of approximately 0.25" x 1.0" x 0.5". Mount the sample, grind, polish and etch a cross-section of the sample. The structural sample is carried out according to the method described in the following literature Prepared by: C.A. Michaluk, C. Heubeck, and H. Klein, Methods for Edtermining the Global Texture of Tantalum Plate Using X-Ray Diffraction, Tantalum , (E.Chem.et al.eds), TMS, Warrendale, PA (1996) pp 123-131, all incorporated herein by reference, except that the polished samples were painted with a 50% HF-50%HNO 3 Reagent grade solution was us...

Embodiment 2

[0093] This analysis was used to determine the Ω and Λ values ​​of tantalum considered unacceptable for use as a sputtering target. Figure 7 Shown is a portion of a tantalum sputter target that was rejected by the user because it formed a film with unacceptable variation in the thickness direction (ie >5%). The corroded surface of the rejected object had a large area with a matte finish interspersed with areas of a shiny finish. Structural analysis showed that the matte finish contained a mixed (111)-(001) structure, while the glossy areas were almost entirely (001) structured. It is thus indicated that the matte areas represent species susceptible to sputter corrosion, whereas the shiny areas are resistant to sputter corrosion, indicating that there are localized regions of major (001) within the tantalum sputter target for sputter performance is detrimental (C.A. Michaluk, d.B. Smathers, and D.P. Field, Affect of Localized Texture on the Sputtering Performance of Tantalum,...

Embodiment 3

[0099] This example was used to determine Ω and Λ values ​​for a tantalum sputter target with desired sputter properties and a tantalum target with edge sputter properties. The pictures of the desired and marginal sputtering targets are as follows Figure 12 and Figure 13 shown. The normal orientation IPF diagrams of the cross-sections of the target carried out from the desired and edges are as Figure 14 and Figure 15 shown. Using the method described in Example 1, samples were prepared and analyzed.

[0100] Ta target performance

[0101] According to the results of Example 2, tantalum species with Ω and Λ values ​​lower than or equal to 74.73 / mm and 4.993 / mm, respectively, are most suitable for sputtering target applications. Example 4

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Abstract

A method for quantifying the texture homogeneity of a polycrystalline material is described. The method involves selecting a reference pole orientation; scanning in increments a cross-section of the polycrystalline material having a thickness with scanning orientation imaging microscopy or other measuring technique to obtain actual pole orientations of a multiplicity of grains throughout the cross-section of the polycrystalline material. The orientation differences between the reference pole orientation and actual pole orientations of a multiplicity of grains is then determined. A value of misorientation from the reference pole orientation at each grain measured throughout the thickness is then assigned. The average misorientation of each measured increment throughout the thickness is then determined. A texture gradient and / or texture banding can then be obtained by determining the first and / or second derivative, respectively, of the average misorientation of each measured increment through the thickness of the sample used for evaluation. A method to predict the sputtering efficiency of a target is also described as well as a system for quantifying the texture homogeneity of a polycrystalline material.

Description

Background of the invention [0001] The present invention relates to the texture of a polycrystalline material and also to a method of determining or quantifying the structural homogeneity of said polycrystalline material. The invention also relates to sputtering targets and measuring sputtering efficiency in sputtering targets. [0002] Certain properties of polycrystalline substances, including deformation behavior, magnetic permeability, corrosion rate, and electron mobility resistance, generally depend on the arrangement of atoms within the substance (J.A. Szpunar, Texture Design for New Application, Proceedings of the Twelfth International Conference on Textures of Materials , J.A. Szpunar (ed.), NRC Research Press, Ottawa, pp.6, 1999), incorporated herein by reference in its entirety. Often, the methods used to make wrought metals and alloys give a preferred orientation to the individual crystallite in the substance. The crystal structure refers to the arrangement of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/20C23C14/34G01N33/20G01Q30/02
CPCH01J37/34C23C14/3414G01N33/20
Inventor 克里斯托弗·A·迈卡鲁克戴维·P·菲尔德
Owner CABOT CORP
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