System and method for removing organic oxide from waste water

A technology for organic matter and wastewater, applied in chemical instruments and methods, multi-stage water/sewage treatment, water/sludge/sewage treatment, etc.

Inactive Publication Date: 2004-03-31
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

UV / Ozone has not been successfully applied to remove semiconductor and LCD process wastewater with high concentration of organic matter so far. Therefore, this is the motivation for us to try to develop this system

Method used

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  • System and method for removing organic oxide from waste water
  • System and method for removing organic oxide from waste water
  • System and method for removing organic oxide from waste water

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] use as figure 1 The module shown in the figure was used to carry out the oxidation removal experiment of organic matter on a wastewater containing IPA with a TOC value of about 18600 ppb.

[0040] The ozone concentration of the ozone / wastewater mixture in the ozone inhaler is maintained at 20ppm, and the pressure difference is 2.8kg / cm 2 . The residence time in the ozone dissolving tank was 41 seconds. The flow ratio of backflow water to outflow water is controlled at 4:1. The TOC value of the effluent was reduced to 12250ppb, and the removal rate was 34%. Repeating the above-mentioned experimental steps, the TOC value dropped from 12250ppb to 7840ppb, and the removal rate was 36%. Repeating the above experimental steps, the TOC value dropped from 7840ppb to 4468ppb, and the removal rate was 43%. It can be seen that when the above steps are implemented repeatedly, the wastewater can be reduced to the desired concentration range; and the series connection of UV / ozon...

Embodiment 2

[0042] The experimental procedure of Example 1 was repeated, but the influent water was changed to a waste water containing NMP with a TOC value of about 10053 ppb, the effluent TOC value was about 6700 ppb, and the removal rate was 33%. Repeating the above experimental steps, the TOC value dropped from 6700ppb to about 3820ppb, and the removal rate was 43%. It can be seen that when the above steps are implemented repeatedly, the wastewater can be reduced to the desired concentration range; and the series connection of UV / ozone oxidation removal modules can be continuous or discontinuous, that is, insert other non-UV / ozone oxidation removal modules between one module and the next module. Other purification components of the ozone oxidation removal module.

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Abstract

A flow of removing organic compounds through oxidation by introducing ozone and ultraviolet radiation, which belongs to removing organic compounds through oxidation from waste water discharged by semiconductor, LCD and other industrials. The system comprises ultraviolet rays/ozone oxidation removal module, or one or several removal modules in series, the series could be continuous or discontinuous. One ultraviolet rays/ozone oxidation removal module mainly includes ozone generator, ozone inhaler, ozone dissolution vessel, ozone destroying device, UV reactive vessel and reflowing circuit. The efficiency of ultraviolet rays/ozone oxidation removal module is controlled by the reflowing water ratio, ozone concentration, intensity of ultraviolet rays.

Description

technical field [0001] The present invention relates to semiconductor, liquid crystal display (LCD) and other related industrial process discharge waste water, and even the organic matter oxidation removal of waste water containing organic pollutants produced by other businesses, and relates to a kind of waste water irradiated by ozone and ultraviolet light. Process and device for oxidative removal of medium organic matter. Background technique [0002] Due to the special geographical environment in Taiwan, the water storage capacity is insufficient, and the development of water resources is not easy. However, the water consumption of various industries is increasing year by year. Especially with the expansion of semiconductor production capacity, the water demand has grown exponentially, making the Science Park in Taiwan Domestic manufacturers are facing severe water shortages and limited water pressure, and it is not easy to develop new water sour...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F9/08
Inventor 金光祖张佩琳
Owner IND TECH RES INST
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