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Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern

A technology of photoresist and composition, which is applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment, and can solve problems such as uncomfortable exposure and difficult resist pattern.

Active Publication Date: 2004-08-11
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0032] However, this resist for liquid crystals has problems such as that it is not suitable for i-line exposure, and it is difficult to form a resist pattern of 2.0 μm or less required in the manufacture of system LCDs.

Method used

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  • Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern
  • Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern
  • Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0179] Prepare the following substances as (A)-(D) components.

[0180] (A) 100 parts by mass of alkali-soluble novolak resin

[0181] MW =6000, M W / M n = 4.0 novolak resin.

[0182] (B) Esterification product (PAC1 / PAC3=2 / 1 (mass ratio))

[0183] 30 parts by mass

[0184] PAC1: M produced as a polycondensate of gallic acid and acetone W The esterification reaction product of 1300 gallic acid-acetone resin and 1,2-naphthoquinonediazide-5-sulfonyl chloride (5-NQD) had an esterification rate of 78%.

[0185] PAC3: 1 mole of bis(2,3,5-trimethyl-4-hydroxyphenyl)-2-hydroxyphenyl produced as a condensation product of 2,3,6-trimethylphenol and 2-hydroxybenzaldehyde An esterification reaction product having an esterification rate of 67.3% between methane (M (molecular weight)=376) and 2.02 moles of 5-NQD.

[0186] (C) 20 parts by mass of compounds containing phenolic hydroxyl groups

[0187] 1-[1-(4-hydroxyphenyl)isopropyl]-4-[1,1-bis(4-hydroxyphenyl)ethyl]benzene

[0188] (...

Embodiment 2-9

[0191] (embodiment 2-9), (comparative example 1-4)

[0192] Except having replaced (B), (D) component with what was described in following Table 1, it carried out similarly to Example 1, and prepared the positive photoresist composition.

[0193] (B)

(D) (mass ratio)

Reality

apply

example

1

PAC1 / PAC3(2 / 1)

PGMEA

2

PAC2 / PAC3(2 / 1)

PGMEA

3

PAC2 / PAC3(1 / 2)

PGMEA

4

PAC1 / PAC3(2 / 1)

EL

5

PAC1 / PAC3(2 / 1)

EL / PGMEA(7 / 3)

6

PAC1 / PAC3(2 / 1)

HE

7

PAC8 / PAC3(2 / 1)

PGMEA

8

PAC9 / PAC3(2 / 1)

PGMEA

9

PAC10 / PAC3(2 / 1)

PGMEA

Compare

compare

example

1

PAC4

PGMEA

2

PAC5

PGMEA

3

PAC6

PGMEA

4

PAC7

PGMEA

[0194] In addition, in Table 1, EL / PGMEA (7 / 3) means mixing EL / PGMEA at a mass ratio of 7 / 3 with respect to ...

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PUM

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Abstract

Provided is a resist material for fabricating an LCD which forms a resist pattern with high resolution even under a low NA condition and has good linearity. A resist pattern is formed by using a positive photoresist composition characterized in that it contains (A)an alkali-soluble resin, (B)an esterification reaction product having an average esterification ratio of 30 to 90% comprising a low-molecular-weight novolac resin having a polystyrene-reduced mass average molecular weight of 300 to 1,300 and a naphthoquinone-diazide-sulfonic-acid compound, (C)a phenolic-hydroxyl-group-containing compound having a molecular weight of not more than 1,000, and (D)an organic solvent.

Description

technical field [0001] The invention relates to a positive photoresist composition for LCD manufacture and a method for forming a resist pattern. Background technique [0002] So far, in the manufacture of a liquid crystal display element (LCD) in which a liquid crystal display portion is formed on a glass substrate, from the viewpoint of being relatively cheap and capable of forming a resist pattern with excellent sensitivity, resolution, and shape, the A positive-type photoresist material composed of a novolac resin-benzoquinonediazide-based compound used in the manufacture of semiconductor devices. [0003] However, for example, with respect to the disk-shaped silicon wafer with a maximum diameter of 8 inches (about 200mm) to 12 inches (about 300mm) used in the manufacture of semiconductor elements, in the manufacture of LCDs, even the smallest is about 360mm×460mm square glass substrate. [0004] In this way, in the field of manufacturing LCDs, substrates coated with a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/023C08G8/32G03F7/004G03F7/022
CPCC08L61/14G03F7/022G03F7/0226G03F7/023G03F7/0233G03F7/0236G03F7/0392
Inventor 大内康秀中山一彦丸山健治土井宏介
Owner TOKYO OHKA KOGYO CO LTD