NiCrOxNy solar spectrum selective absorbing thin-membrane and preparing method thereof

A technology of absorbing film and solar spectrum, which is applied in NiCrOXNY solar spectrum selective absorbing film and preparation field, can solve the problems that vacuum tubes cannot be made into building blocks, increase the demand for solar spectrum selective film heat absorbing board core, etc.

Inactive Publication Date: 2005-02-23
GUANGZHOU INST OF ENERGY CONVERSION - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The most fundamental problem of the existing vacuum tube solar collectors is that the vacuum tubes cannot be combined with the overall structure of the building plate and the building. Therefore, the flat plate solar water heaters in some major developed countries in foreign countries account for more than 92% of the market. As building materials, Realize the integration of solar energy utilization and building, and promote the widespread use of solar water heaters, solar air conditioners and other photothermal products, and the expansion of the types and application range of photothermal products will greatly increase the demand for solar spectrally selective thin-film heat-absorbing board cores. need

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Operation steps: Use mechanical and chemical methods to remove the contamination layer and oxide layer on the surface of the copper plate core - Place the copper plate core on the sample holder of the magnetron sputtering machine - Vacuumize and bake to improve the vacuum quality, set the baking temperature to 90°C, The background vacuum reaches 5×10 -3 Pa-Introduce 60 sccm of Ar gas through the mass flow meter, adjust the vacuum degree of the vacuum chamber to 0.5Pa, turn on the target power supply, target voltage 420V, current 5A, pre-sputtering target surface cleaning treatment, about 15 minutes to 20 minutes-revolving sample Stand and pass oxygen 15sccm, nitrogen 30sccm, keep the sputtering working pressure at 0.5Pa, current 5A, sputter for 5 minutes - pass oxygen 20sccm, nitrogen 30sccm, keep the sputtering working pressure at 0.5Pa, current 5A, sputter for 5 minutes -- pass Oxygen 30sccm, stop nitrogen, keep sputtering working pressure 0.8Pa, current 5A, sputterin...

Embodiment 2

[0020] Operation steps: Use mechanical and chemical methods to remove the contamination layer and oxide layer on the surface of the copper plate core - Place the copper plate core on the sample holder of the magnetron sputtering machine - Vacuumize and bake to improve the vacuum quality, set the baking temperature to 90°C, The background vacuum reaches 5×10 -3 Pa-Introduce 60 sccm of Ar gas through the mass flow meter, adjust the vacuum degree of the vacuum chamber to 0.5Pa, turn on the target power supply, target voltage 420V, current 5A, pre-sputtering target surface cleaning treatment, about 15 minutes to 20 minutes-revolving sample Stand and pass oxygen 12sccm, nitrogen 30sccm, keep sputtering working pressure at 0.5Pa, current 5A, sputter for 6 minutes - pass oxygen at 18sccm, nitrogen 30sccm, keep sputtering working pressure at 0.5Pa, current 5A, sputter for 7 minutes--on Oxygen 25sccm, stop nitrogen flow, keep sputtering working pressure 0.8Pa, current 5A, sputtering fo...

Embodiment 3

[0026] Use mechanical and chemical methods to remove the contamination layer and oxide layer on the surface of the copper plate core - place the copper plate core on the sample holder of the magnetron sputtering machine - vacuumize and bake to improve the vacuum quality, set the baking temperature to 90°C, and the background vacuum up to 5×10 -3 Pa-Introduce 60 sccm of Ar gas through the mass flow meter, adjust the vacuum degree of the vacuum chamber to 0.5Pa, turn on the target power supply, target voltage 420V, current 5A, pre-sputtering target surface cleaning treatment, about 15 minutes to 20 minutes-revolving sample Set up and pass nitrogen 30sccm unchanged, gradually pass oxygen from 0 to 30sccm, increase 3sccm per minute, keep sputtering working pressure 0.5Pa, current 5A, sputtering for 10 minutes--stop nitrogen flow, keep 35sccm oxygen flow to keep sputtering work Air pressure 0.8Pa, current 5A, sputtering for 10 minutes - shutdown

[0027] Technical indicators:

[...

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Abstract

Selective solar spectrum-absorbing films of NiCrOxNy are produced by magnetic sputtering process on copper substrate. The films have high absorbing rate and low reflecting rate, and strong adhering ability, and can be colored for decoration and be used as functional materials of construction.

Description

technical field [0001] The invention uses the magnetron sputtering coating technology to prepare solar spectrum selective absorption thin film materials to realize high-efficiency solar light-to-heat conversion. Background technique [0002] The most direct and effective way to utilize solar energy is to convert solar energy into thermal energy for utilization, and the efficiency of solar collectors is mainly determined by two factors, one is the ability of the collector to absorb solar radiation; the other is the heat dissipation of the collector degree of loss. The general principle of improving its efficiency is to absorb solar radiation energy as much as possible and reduce heat loss as much as possible, and the spectrally selective absorption film is a surface that has good absorption performance for short-wave radiation of the sun and only a small amount of heat radiation. Therefore, the use of solar spectrum selective absorption film is one of the most effective meas...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F24J2/50
CPCY02E10/40
Inventor 沈辉汪保卫林洪
Owner GUANGZHOU INST OF ENERGY CONVERSION - CHINESE ACAD OF SCI
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