Computer controlled filming device

Abstract

A computer controlled plating apparatus is composed of an optical film thickness monitor system consisting of light source and emitting system, monitor chip, signal receiver system and phase-locked amplifier, the computer with control program consisting of parameter setting-up module and data processing module, crystal controller, and barrier switch controller.

Description

technical field [0001] The invention relates to film coating, in particular to a computer-controlled film coating device capable of monitoring regular film systems and irregular film systems. Background technique [0002] In the preparation of thin films, in addition to selecting appropriate materials and preparation processes, the thickness must also be precisely controlled. Thickness, as one of the most important optical film parameters, decisively affects the mechanical properties, electrical properties and optical properties of films; on the other hand, almost all film properties are related to thickness. Therefore, accurately controlling the thickness of the film becomes the key to the preparation of optical films. figure 1 The optical path diagram of the optical film thickness monitoring system (application number: 200510024987.1, application date: April 28, 2005) invented by the inventor is provided. The optical film thickness monitoring system is monitored by the li...

AI Technical Summary

Problems solved by technology

The system is monitored manually. Due to the large random factors, the stability, repeatability and monitoring accuracy are affected, and the optical film thickness monitor can only monitor the regular film system; in addition, some equipment uses crystal controllers to obtain The thickness of the film layer is monitored. This method can monitor the irregular film system, but it also infiltrates some human factors, which affect the stability, repeatability and monitoring accuracy.

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