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Photosensitive resin composition

A technology of photosensitive resin and composition, applied in optics, photosensitive materials for optomechanical equipment, optomechanical equipment, etc.

Active Publication Date: 2010-09-01
SUMITOMO CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the radiation-sensitive curable resin, an isocyanate compound is used to introduce (meth)acryloyl groups, and in the treatment of the resulting radiation-sensitive curable resin and the use of the resin During the process of forming the composition of the spacer, there is a problem of odor caused by isocyanate compounds
[0005] In addition, when a structure such as a photo spacer is formed using a resin composition containing the radiation-sensitive curable resin, there is also a problem of poor solvent resistance. question

Method used

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  • Photosensitive resin composition
  • Photosensitive resin composition
  • Photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0155]

[0156] Explanation of the constituent units

[0157] a: Constituent unit derived from (A1) in copolymer 1

[0158] b: Constituent unit derived from (A2) in copolymer 1

[0159] c: A constituent unit formed by reacting a constituent unit derived from (A4) in copolymer 1 with (A3)

[0160] d: A constituent unit formed by reacting a part derived from (A3) in copolymer 2 with (A5)

[0161] e: The constituent unit derived from (A1) in the copolymer formed by the reaction of (A1), (A2) and (A3)

[0162] f: Constituent units derived from (A2) in the copolymer formed by the reaction of (A1), (A2) and (A3)

[0163] g: Constituent unit derived from (A3) in the copolymer formed by the reaction of (A1), (A2) and (A3)

[0164] h: A constituent unit formed by reacting a constituent unit derived from (A4) with a constituent unit derived from (A3) in a copolymer formed by reacting (A1), (A2) and (A3)

[0165] Table 1

[0166]

Resin A

Resin B

Resin C

...

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Abstract

A photo sensitive resin composition comprises (A) adhensive resins, (B) photopolymerisable compounds, (C) photopolymerization evocating agents and (D) a dissolvent, wherein, adhensive resins are co-polymers prepared by copolymerizing the following components (A1), (A2), (A4) to obtain a copolymer 1, further reacting the copolymer 1 with component (A3) at an epoxy group position to obtain a copolymer 2, and reacting the copolymer 2 and (A5) with hydroxyl groups formed by (A3) and (A4) of copolymer 1; the photopolymerization evocating agents (C) is selected at least one from hypnone compounds, bi-glyoxalinyl compounds, oximido compounds and triazine radical compounds: the component (A1) is a compound having a skeleton selected from tricyclodecane and dicyclopentadiene and an unsaturated bond; the component (A2) is a compound copolymerizable with components (A1) and (A4); the component (A3) is a carboxylic acid having an unsaturated bond; the component (A4) is a compound having an unsaturated bond and an epoxy group; the component (A5) is an acid anhydride, and (A1) is not the same as (A5).

Description

technical field [0001] The invention relates to a photosensitive resin composition. Background technique [0002] Between a color filter and an array substrate constituting a display such as a liquid crystal display and a touch panel, a spacer is provided to keep the two substrates at a distance. As the spacer, spherical particles such as glass beads, plastic beads, etc. are generally used. [0003] However, when spherical particles are used, TFT elements, electrodes, etc. are damaged due to their random distribution on the glass substrate, and when they exist in transparent pixel parts, the contrast of the liquid crystal display element is sometimes affected by the variation of incident light. scatter and decrease. Therefore, as an alternative to dispersed spherical particles, it has been proposed to use a photosensitive resin to form spacers. By this method, the spacer can be formed at an arbitrary position, so that the above-mentioned problems can be solved. As such ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004
CPCG03F7/027G03F7/0295G03F7/033G03F7/0007C08F265/06G03F7/0388C08F220/325C08F2/50
Inventor 武部和男
Owner SUMITOMO CHEM CO LTD