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Wafer defect management method

A defect management and chip defect technology, applied in data processing applications, instruments, electrical components, etc., can solve problems such as insufficient hardware resources, poor management efficiency, and difficult-to-integrate data processing

Inactive Publication Date: 2006-05-10
POWERCHIP SEMICON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the improvement of the resolution of the defect detection machine and the expansion of the wafer size, a large amount of original defect point data will be generated after defect detection
As is well known to those skilled in the art, the hardware resources of the terminal are usually not sufficient, not only cannot effectively store a large amount of original defect point data, but also it is difficult to efficiently perform integrated data processing
Moreover, the defect point distribution of the same chip may need to be notified to many engineers at different terminal terminals. If each terminal terminal needs to perform its own integrated data processing, it will waste the hardware resources of each terminal repeatedly. , leading to ineffective management

Method used

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Embodiment Construction

[0017] Please refer to figure 1 , figure 1 It is a flow chart of the wafer defect management method of the present invention, and its method includes the following steps:

[0018] Step 100: inspect each chip on a wafer with an inspection machine, so as to generate defect raw data (raw data) for the chips on the wafer;

[0019] Step 102: Perform data pre-processing on the server side to integrate the original defect data of each chip on the wafer, and generate a wafer defect distribution data in an integrated manner, which is used to record the distribution position and type of each defect point relative to the entire wafer ( type) and size (size);

[0020] Step 104: performing a graphic preprocessing step on the server side to draw a corresponding graphic file according to the defect distribution data of each wafer to present various distribution types of defect points on each wafer; and

[0021] Step 106: When the engineer of the terminal machine wants to check the distrib...

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Abstract

This invention provides one crystal deficiency management method, which comprise the following steps: testing each chip on the crystal deficiency original data; integrating the original data to generate one crystal deficiency distribution data to record each deficiency point distribution position, shape and size; drawing one relative pattern film according to the crystal deficiency slice to take in distribution status; transmitting the pattern film to one terminal machine to make it not receive original data to display the pattern file to the user.

Description

technical field [0001] The present invention relates to a wafer defect management method, in particular to a wafer defect management method that draws corresponding graphics files in advance according to wafer defect data on a server host to reduce computing requirements of a manager's terminal. Background technique [0002] In the semiconductor manufacturing process, after the wafer is processed by the semiconductor machine, the semiconductor manufacturer will perform defect inspection (defect inspection, such as bright field or dark field defect inspection) on the processed wafer to improve the finished product of the wafer in the manufacturing process Rate (yield). This type of inspection is mostly performed on the basis of each chip on the wafer. When testing, the detection machine will use a given position on a chip as a reference position, and use the detection result of this reference position as a reference value to measure the relative position of other positions o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/66G06Q90/00H01L21/00
Inventor 王胜仁戴鸿恩陈嘉云
Owner POWERCHIP SEMICON CORP