Quickflashing memory unit manufacturing method
A storage unit and manufacturing method technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as influence, poor quality of gate oxide layer, and limitation of surface cleaning steps
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[0015] The method of the present invention will be described in detail according to the following preferred embodiment and with reference to the accompanying drawings.
[0016] A preferred embodiment of the invention is shown in Figure 1A to Figure 1D and Figure 2A to Figure 2E ,in Figure 1A to Figure 1D It is a schematic cross-sectional view of various formation steps of the peripheral region (periphery region) of the flash electrically erasable and programmable read-only memory unit of the present invention, and Figure 2A to Figure 2E It is a schematic cross-sectional view of various formation steps of the memory cell region of the flash electrically erasable and programmable read-only memory unit of the present invention.
[0017] refer to Figure 1A and Figure 2A , a tunnel oxide layer 101 is formed on a semiconductor substrate 100 with a first conductivity. The semiconductor substrate 100 can be an N-type or P-type substrate, preferably a P-type silicon substrate....
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