Method for mfg. nano-sticking paper
A manufacturing method, nanotechnology, applied in the field of nanotechnology, can solve the problems that cannot meet the needs of the industry, cannot meet the needs of mass production and low cost, and cannot meet the needs of mass production.
Inactive Publication Date: 2007-01-31
CONTREL TECH CO LTD
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Problems solved by technology
[0003] Among the currently known technologies, there is a scanning electron beam plate printing technology (K.C.Beard, T.Qi.M.R.Dawson, B.Wang.C.Li, Nature 368, 604 (1994).), with 10 nanometers resolution; however, since this technology is arranged in series in the form of point by point, its production speed is extremely low and cannot meet the needs of mass production
Another technology is X-ray plate printing technology (M.Godinot and M.Mahboubi, C.R.Acad.Sci.Ser.II Mec.Phys.Chim.Chim.Sci.Terre Univers.319, 357(1994); M.Godinot, in Anthropoid Origins, J.G.Fleagle and R.F.Kay, Eds. (Plenum, New York, 1994), pp.235-295.), with a resolution of 20 nanometers, is a mode of contact transfer, which can It has high productivity; however, its photomask technology and exposure technology are very complex and expensive, which also cannot meet the needs of the industry
Also, there is a plate printing technique (E.L.Simons and D.T.Rasmussen, Proc.Nati.Acad.Sci.U.S.A.91, 9946 (1994); Evol.Anthropol.3, 128 (1994)) of a proximity scanning probe, which has The resolution of 10 nanometers is an earlier technology; this technology cannot meet the industrial mass production and low-cost requirements
Method used
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[0020] Such as Figure 1 to Figure 7 As shown, the manufacturing method of a nano-sticker provided by the first preferred embodiment of the present invention mainly includes the following steps:
[0021] a) In a vacuum environment, prepare a substrate 11 and a transfer stamp 21, the transfer stamp 21 is plate-shaped, with a transfer surface 22 at the bottom, and nano-relief 24 is provided on the surface of the transfer surface 22. The nano-relief 24 is composed of a plurality of convex portions 241 and a plurality of concave portions 243. The substrate 11 has an etching layer 12, and the etching layer 12 is a polymer material (polymer), and its state is as follows: figure 1 shown;
[0022] b) Carry out a pick-up procedure, such as figure 2 As shown, one of the convex portion 241 or the concave portion 243 of the nano-relief 24 is dipped with the photoresist material 26, wherein, the state of dipping the photoresist material 26 with the convex portion 241 is as shown in FIG....
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The invention relates to a manufacture method for nanometer paster that includes the following steps: making a base board and a transferal seal under vacuum environment, the transferal seal has a transferal surface that has nanometer wale and the base board has a etching layer; taking sticking process to make one from nanometer banquette or rabbet stick a photo-resistive material, taking a transferal process to make the nanometer wale contact with etching layer and transfer printing the photo-resistive material onto the etching layer surface; taking etching process. After taking the previous steps, the producing of nanometer paster would be used in industry and the cost would be lowered.
Description
technical field [0001] The present invention is related to nanotechnology, in particular to a method for manufacturing nano stickers that can meet the demands of industrial mass production and low cost. Background technique [0002] Among the technologies for manufacturing nano stickers, Lithography Techniques are currently used to meet the needs of mass production and low prices. Among them, technologies with a line width of less than 50 nanometers can meet the requirements of future semiconductor integrated circuits and electronic commerce. The manufacturing needs of the chemical, optoelectronic industries, and magnetic nano-devices. [0003] Among the currently known technologies, there is a scanning electron beam plate printing technology (K.C.Beard, T.Qi.M.R.Dawson, B.Wang.C.Li, Nature 368, 604 (1994).), with 10 nanometers resolution; however, since this technology is arranged in series in a point-by-point manner, its production speed is extremely low and cannot meet t...
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Login to View More IPC IPC(8): G03F7/00G03F7/16H01L21/027
CPCG03F7/0002B82Y10/00B82Y40/00
Inventor 赵治宇谢文俊
Owner CONTREL TECH CO LTD