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Substrate positioning device and storing unit

A technology of positioning device and storage unit, which is applied in the direction of electrical components, transportation and packaging, lighting and heating equipment, etc., can solve the problem of the limit of miniaturization of the load lock chamber, and achieve the goal of avoiding huge size, reducing the installation space, and accurately positioning Effect

Active Publication Date: 2007-03-14
TOKYO ELECTRON LTD
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  • Abstract
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Problems solved by technology

However, in the technology of the above-mentioned Patent Document 1, since a pair of rollers are supported on the supporting body to constitute the positioner, it has to be a relatively large device itself, but for its movement in the diagonal direction and the vertical direction , part of the space is necessary, so there is a limit to the miniaturization of the load lock chamber

Method used

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  • Substrate positioning device and storing unit
  • Substrate positioning device and storing unit
  • Substrate positioning device and storing unit

Examples

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Embodiment Construction

[0031]Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. Here, an example in which the substrate positioning device of the present invention is used in a load lock device constituting a multi-chamber plasma processing apparatus for performing plasma processing on a glass substrate for FPD (hereinafter simply referred to as "substrate") S will be described. . Here, examples of the FPD include a liquid crystal display (LCD), a light emitting diode (LED) display, an electroluminescence (Electro Luminescence; EL) display, a fluorescent display tube (Vacuum Fluorescent Display; VFD), a plasma display panel ( PDP) etc.

[0032] 1 is a perspective view schematically showing a plasma processing apparatus in which a substrate positioning device according to an embodiment of the present invention is applied to a load lock chamber, and FIG. 2 is a horizontal cross-sectional view schematically showing its interior.

[0033] In t...

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Abstract

The invention provides a substrate positioner which positions a substrate while making a space around the substrate as small as possible in a container for containing the substrate such as a load lock chamber or the like. The substrate positioner comprises: a pair of positioners (7) which press a pair of ends (S1) perpendicular to a transfer direction of a substrate (S); and a pair of positioners (8) which press a pair of ends (S2) along the transfer direction of the substrate (S). The first and second positioners (7, 8) have pressers (70, 80) which press the ends (S1, S2) by advance of cylinder mechanisms (71, 81) and pistons (74, 84) of the cylinder mechanisms (71, 81). The first positioner (7) further comprises a driving force conversion mechanism (72) which moves the presser (70) between an evacuation position of evacuating the presser (70) to an outside of a transfer route of the substrate (S), and a press position to press the substrate (S) by advance of the piston (74), and also moves the presser (70) to a press direction at the press position.

Description

technical field [0001] The present invention relates to a substrate positioning device for positioning a substrate such as a glass substrate for a flat panel display (FPD), and a substrate storage unit provided with the substrate positioning device. Background technique [0002] In the FPD manufacturing process, a so-called multi-chamber equipped with a plurality of vacuum processing chambers for performing processes such as etching, ashing, and film formation on a glass substrate in a vacuum state is used. type of vacuum treatment device. [0003] In such a vacuum processing apparatus, in order to load / unload substrates in the vacuum processing chamber, it is not necessary to return the vacuum processing chamber to normal pressure every time, but the gate valve is used to pass through the opening that can be opened and closed freely, so that the load as the preliminary vacuum chamber The lock chamber is connected to the vacuum processing chamber. The pre-processed substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/68H01L21/677B65G49/06
CPCG02F1/1303H01L21/67201H01L21/68
Inventor 羽立良幸
Owner TOKYO ELECTRON LTD