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Projection optical system, exposure apparatus, and exposure method

A technology of projection optical system and exposure device, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problem of low resolution ability and achieve the effect of large resolution ability

Active Publication Date: 2011-07-06
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] In this case, the aperture of the optical system is in the shape of a ring, which is limited to a specific spatial frequency and the resolution is low, so it is not suitable for etching

Method used

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  • Projection optical system, exposure apparatus, and exposure method
  • Projection optical system, exposure apparatus, and exposure method
  • Projection optical system, exposure apparatus, and exposure method

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Embodiment Construction

[0042] Below, prior to the description of the embodiments of the present invention, disadvantages of the prior art will be specifically described. In a reflective projection optical system in which the field of view area and the imaging area are separated from the optical axis, the numerical aperture NA on the optical axis in the conventional sense cannot be defined. Therefore, the numerical aperture NA outside the optical axis, such as figure 1 Defined as shown.

[0043] refer to figure 1 , the numerical aperture NAo on the optical axis utilizes the angle formed by the light rays arriving at the outermost edge of the image plane IP (the light rays that pass through the edge of the aperture portion and arrive at the image plane IP) and the optical axis AX, that is, the incident angle θ, by the following formula (1) to express. On the other hand, the numerical aperture NA other than the optical axis is used by the incident angle θ of the light rays reaching the outermost e...

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Abstract

There is provided a reflection optical system having a viewing field region and an image formation region which regions are located apart from an optical axis and numerical aperture of the light flux reaching each point on the image is almost uniform not depending on the image height or direction. The projection optical system includes an aperture diaphragm (AS) for defining the numerical aperture of the projection optical system. The aperture diaphragm has an aperture unit of a necessary shape for making the numerical aperture of the light flux reaching each point in a predetermined region almost uniform not depending on the direction. The necessary shape of the aperture unit is defined so as to compensate the affect given to uniformity of the numerical aperture of the light flux reaching each point in the predetermined region by that the partial optical systems (M2 to M6) arranged between the aperture diaphragm and the image surface (W) do not satisfy the desired projection relationship.

Description

technical field [0001] The invention relates to a projection optical system, an exposure device and an exposure method. More specifically, the present invention relates to a projection optical system suitable for use in an exposure device used for manufacturing components such as semiconductor devices by a photolithography process using EUV (extreme extreme ultraviolet) light. Background technique [0002] In the known exposure device used in the manufacture of semiconductor elements, etc., the circuit pattern formed on the mask (grating) is projected onto a photosensitive substrate (such as a wafer) through a projection optical system. print. A photoresist is coated on the photosensitive substrate, and the photoresist is exposed to light by projection exposure through a projection optical system to obtain a photoresist pattern corresponding to the photomask pattern. [0003] Here, the resolving power of the exposure apparatus depends on the wavelength λ of the exposure li...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/70233G03F7/7025G02B17/02G03F7/70091
Inventor 小松田秀基高桥友刀铃木雅之
Owner NIKON CORP