Substrate conveying system, substrate conveying device and substrate treatment device

Abstract

The objective of this invention is to transport substrate to avoid coating film uneven on the glass substrate. In front and back of the support for resist coating processing components, the first transporter and the second transporter is arranged. The second transporter comprises plural rollers arrange at Y direction, holder for supporting rollers and track board for fixing holder. A rotary driver part makes rollers rotated and a horizontal driver part makes the holder advanced and retreated along Y direction is arranged on the holder. Lift pin groups lift free and independent for each other are arranged on the support. In the station of the glass substrate uplifted by lift pin groups, rollers enter under the glass substrate and take over it. The roller rotates and transports the glass substrate to back at low speed and recedes at the same time.

Description

technical field [0001] The present invention relates to a substrate transfer system, a substrate transfer device, and a substrate processing device for transferring a substrate to a coating processing unit that applies a coating liquid to a substrate. Background technique [0002] For example, in the photolithography process of the manufacturing process of a liquid crystal display, the resist coating process which coats a resist liquid on a glass substrate is performed. [0003] The above-mentioned resist coating process is performed, for example, in the resist coating process part located in the conveyance path of a glass substrate. Usually, the glass substrate is once placed on a carry-in table on a conveyance path, and is conveyed from this carry-in table to a resist coating processing part. Moreover, the glass substrate which finished the resist coating process is sent out from the resist coating processing part to the delivery table. The transport of the glass substra...

AI Technical Summary

Problems solved by technology

However, in the vicinity of the resist liquid coating equipment, the mechanical vibration generated when the transport robot accesses other processing equipment or components, or when the substrate is carried in and out, is transmitted on the ground and affects the coating process. In the case of the table, there is a problem that the coating gap changes due to the influence of the vibration, and the film thickness of the resist coating film on the substrate varies or the coating is uneven.

In addition, the rotation movement or arm back-and-forth movement caused by the erroneous operation of the transport robot poses a problem in terms of the safety of maintenance workers and the like.

Furthermore, the increased deflection of the transfer arm due to the increase in the size of the substrate is also a problem

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