Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases

Abstract

A delivery system and method for vaporizing and delivery of vaporized solid and liquid precursor materials at sub-atmospheric pressures between a heatable vaporization vessel and a processing tool. The system includes a pressure regulator internally positioned within the vaporization vessel and in fluid communication with a downstream mass flow controller to maintain a consistent flow of vaporized source material. The system further comprises introducing a carrier / diluent gas for diluting the vaporized source material before entry into the processing tool. A venturi is positioned directly upstream of the processing tool and provides for mixing of the carrier gas with the vaporized source material while providing the negative pressure required to open the gas pressure regulator within the vaporization vessel.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS [0001] This is a divisional application of U.S. patent application Ser. No. 10 / 369,829 filed in the name of Karl W. Olander on Feb. 19, 2003 and entitled “SUB-ATMOSPHERIC PRESSURE DELIVERY OF LIQUIDS, SOLIDS AND LOW VAPOR PRESSURE GASES.”BACKGROUND OF INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a vapor delivery system and method of use, and more particularly, to a delivery system for vaporized liquids, solids or low vapor pressure gases at sub-atmospheric pressures for use in metalorganic chemical vapor deposition (MOCVD) and chemical vapor deposition (CVD) processes. [0004] 2. Description of the Related Art [0005] MOCVD and CVD have been extensively used for preparation of films and coatings in semiconductor wafer processing. These deposition processes are favored because of their ability to provide highly conformal and high quality films, at relatively fast processing times. Further, these deposition pr...

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Benefits of technology

[0020] The processing tool may function at a lower sub-atmospheric pressure than that set in the gas pressure regulator thereby causing the gas pressure regulator to switch on and permit the vaporized source material to flow from the vaporization vessel. In the alternative, if the pressure is higher in the processing tool, the use of a venturi will act as a vacuum generator to provide sufficiently low pressure to actuate the pressure regulator within the vaporizer vessel thereby releasing the vaporized source material. Still further, in some conditions the use of a venturi may not be adequate to sufficiently reduce the pressure in the system and the use of vacuum pump, preferably a turbo pump connected via a manifold to a storage vessel, may be utilized to reduce the pressure in the connecting line. In all the alternative ways, the present invention eliminates the need for introducing a carrier gas directly into the vaporization vessel thereby reducing the inherent problems of tunneling within the bulk material.

[0039] a) heating a source material in a vaporization vessel at a temperature that generates a vaporized source material at a sufficient vapor pressure without decomposition of vaporized source material;

Problems solved by technology

Still further, in some conditions the use of a venturi may not be adequate to sufficiently reduce the pressure in the system and the use of vacuum pump, preferably a turbo pump connected via a manifold to a storage vessel, may be utilized to reduce the pressure in the connecting line.

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