Low melting temperature alloy structure for enchanced thermal interface
a low melting temperature alloy and thermal interface technology, applied in the direction of semiconductor/solid-state device details, lighting and heating apparatus, device performance challenges, etc., can solve the problems of more challenging interfaces to fabricate and maintain, problems associated, etc., to prevent leakage and oozing of alloy to surrounding areas, increase rigidity and compressibility, and enhance thermal interface
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first embodiment
[0028]FIG. 2, is a cross sectional illustration of the present invention. In FIG. 2, a first embedded structure 200 is illustrated. The structure is preferably comprised of metal and has a form, such as being apertured, so that it can maintain a level of structural integrity and rigidity while being able to become embedded in an alloy 210 as will be discussed.
[0029] Despite some desired structural rigidity, in some instances it may be required for the interface and the structure 200 involved to maintain certain level of flexibility and compressibility. In this regard, it should be noted that the level of rigidity (or even compressibility) can be selectively achieved, maintained or increased by increasing or decreasing the level of surface apertures. In one embodiment of the present invention, the structure 200 has a mesh like structure to provide both rigidity and compressibility at the same time. In a preferred embodiment, the structure 200 is a wire mesh that it can easily contain...
second embodiment
[0036]FIG. 3 provides for an alternate embodiment of the present invention. In FIG. 3, a cross sectional illustration of a second embodiment for forming the interface 130 of FIG. 1 is provided using a foil 300. The foil 300 is embedded in a low-melting alloy 310 as depicted. As before the material of the foil 300 and the low melting alloy 310 have to be such that they do not readily react with one another.
[0037] In a preferred embodiment, before the foil 300 is embodied in the alloy 310, it is well cleaned by means known to those skilled in the art. To do so, in a preferred embodiment, the foil 300 is cleaned by sputter etching as before.
[0038] The thickness of the alloy embedded structure (300) can be selectively altered. In this case, the thickness can be a combination of thickness of the foil 300 or the applied alloy 310. The low melting alloy can also be applied by a variety of methods known to those skilled in the art as discussed before. For example, metal can be sputtered on...
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Abstract
Description
Claims
Application Information
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