Method for manufacturing magnetic head device
a manufacturing method and magnetic head technology, applied in the direction of vacuum evaporation coating, electrogenerative processes, coatings, etc., can solve the problems of deteriorating magnetic characteristics and abnormal magnetic domains, and achieve superior magnetic anisotropy, reduce scattering, and reduce the effect of magnetic field stability
Inactive Publication Date: 2008-03-13
FUJITSU LTD
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Benefits of technology
The present invention provides a method for manufacturing a highly sensitive magnetic head device with good shield characteristics. The method involves forming a plating base layer in the soft magnetic layer through sputtering and applying a magnetic field in a direction parallel to the orientation fringe of the wafer in which the magnetic head device is formed. This plating base layer has superior magnetic anisotropy and helps shield the external magnetic field. The soft magnetic layer can also be formed using electroplating and heat treatment in the magnetic field. The method can also include heat treatment in a non-magnetic field followed by heat treatment in the magnetic field to recover from any deterioration of the magnetic characteristic due to the heat treatment at room temperature. The magnetic head device is a composite head device that includes a write head device and a read head device.
Problems solved by technology
When it inclines to the predetermined direction, the abnormal magnetic domain occurs and deteriorates the magnetic characteristic.
Method used
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[0043]According to the manufacturing method of this embodiment, two magnetic domains (ideal magnetic domains), three magnetic domains, and abnormal magnetic domains are observed after the plating base layer is sputtered while the magnetic field is applied parallel to the orientation fringe OF, after the heat treatment in the magnetic field, after the heat treatment in the nonmagnetic field, and after the reheat treatment in the magnetic field. In other words, this observation corresponds to an observation after each of the steps 1002, 1012, 1040, and 1042 shown in FIG. 6B. In general, {100%−(a ratio (%) of the two magnetic domains)+(a ratio (%) of the three magnetic domains)}=(a ratio (%) of the abnormal magnetic domains) is met, but four or more magnetic domains can exist. The two magnetic domains mean that there are two magnetic domains 2a and 2b parallel to the longitudinal direction, as shown in FIG. 7, in the reflux magnetic domain. On the other hand, the three magnetic domains...
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Abstract
A method for manufacturing a magnetic head device that includes a soft magnetic layer includes the steps of forming a plating base layer in the soft magnetic layer through sputtering, and applying, during the forming step, a magnetic field in a direction parallel to an orientation fringe of a wafer in which the magnetic head device is formed.
Description
[0001]This application claims the right of foreign priority under 35 U.S.C. §119 based on Japanese Patent Application No. 2006-246633, filed on Sep. 12, 2006, which is hereby incorporated by reference herein in its entirety as if fully set forth herein.BACKGROUND OF THE INVENTION[0002]The present invention relates generally to a magnetic head device manufacturing method, and more particularly to a method for manufacturing a magnetic head device including a soft magnetic layer, such as a shield layer. The present invention is suitable, for example, for a read head having a magnetoresistive device used for a hard disc drive (“HDD”).[0003]Along with the recent widespread Internet, a magnetic disc drive that records a large amount of information including still and motion pictures has been increasingly demanded. When the surface recording density is increased so as to meet the large-capacity demand, the 1-bit area as a minimum unit of the magnetically recorded information on the recordi...
Claims
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IPC IPC(8): C25B5/00
CPCC23C14/584C23C14/5806
Inventor KOMURO, TSUTOMU
Owner FUJITSU LTD