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Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus

a wavelength measurement and wavelength measurement technology, applied in the direction of instruments, material analysis using wave/particle radiation, nuclear engineering, etc., can solve the problems of complex structure and inability to simply measure, and achieve the effect of simple alignment, high precision and easy measuremen

Inactive Publication Date: 2008-10-02
RIGAKU CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0007]The present invention is achieved with the view of such circumstances, and aims to provide a method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus for easily determining absolute wavelength and carrying out precise wavelength measurement with a simple structure.

Problems solved by technology

Consequently, for the alignment to adjust a standard position, a special technique is required, and the measurement can not be carried out simply.
Further, an X-ray wavelength measurement apparatus of two-crystal arrangement, which utilizes the arrangement of two planar analyzing crystals, needs an interlocking mechanism and results in a complex structure.

Method used

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  • Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus
  • Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus
  • Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus

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Effect test

embodiment 1

[0037]FIG. 1 is a plan view showing the outline of the configuration of an X-ray wavelength measurement apparatus 1 according to the present invention. As shown in FIG. 1, the X-ray wavelength measurement apparatus 1 includes a channel-cut crystal for collimator 10, a channel-cut crystal for wavelength measurement 20, a rotatable platform 50, an angle detector 60 and an X-ray detector 100. The channel-cut crystal is prepared by carving grooves to a unitary crystal block, and the parallel walls on both sides thereof are utilized for reflection, that is, diffraction. For the channel-cut crystal, the whole is composed of unitary crystal, and therefore all X-rays Bragg-reflected by one crystal wall cause Bragg reflection by the other crystal wall. The X-ray wavelength measurement apparatus 1 spectrally reflects X-ray having a specified wavelength out of incident X-ray having a continuous spectrum, and measures the intensity thereof with the X-ray detector 100. The X-ray wavelength measu...

embodiment 2

[0054]In the above-described Embodiment 1, the rotation center C1 is so provided that X-ray enters different cut planes when the channel-cut crystal for wavelength measurement 20 is set to respective arrangements of (+, −) and (−, +), but the rotation center may be provided so that X-ray may enter the identical cut plane. FIG. 3 is a schematic drawing showing the X-ray wavelength measurement apparatus 1 in which the channel-cut crystal for wavelength measurement is so arranged that X-ray enters the identical cut plane. A channel-cut crystal for collimator 30 has a first crystal wall 31 and a second crystal wall 32, and, at respective crystal walls, a first cut plane 31a and a second cut plane 32a facing each other are formed. The lengths of respective crystal walls are shortened in different directions in accordance with the passing channels of X-ray beams so that a large diffraction angle can be obtained. For a scheme to obtain a large diffraction angle, as shown in FIG. 4, crystal...

embodiment 3

[0062]The above-described X-ray wavelength measurement apparatus 1 of the Embodiment 1 can measure absolute wavelength with high precision, but it is also possible to carry out precise calibration by giving additional self-calibration function to the angle detector.

[0063]FIG. 6 is a side view showing an X-ray wavelength measurement apparatus 2 provided with an angle detector having self-calibration function. As shown in FIG. 6, the X-ray wavelength measurement apparatus 2 includes a channel-cut crystal for collimator 10, a channel-cut crystal for wavelength measurement 20, a fixed platform 49, a rotatable platform 50, a rotary driving instrument 55, an angle detector 60, a controlling section 70 and a detector 100. The rotary driving instrument 55, the angle detector 60 and the controlling section 70 constitute a rotation control mechanism.

[0064]The rotatable platform 50 is connected to the rotary driving instrument 55 capable of rotation at intervals of a minute angle. The rotary d...

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Abstract

A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (−, +) and (+, −) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a method for X-ray wavelength measurement and X-ray wavelength measurement apparatus for carrying out X-ray wavelength measurement with high precision.[0003]2. Description of the Related Art[0004]Such an X-ray wavelength measurement apparatus for carrying out X-ray wavelength measurement with high precision by using a slit to narrow down the incident direction of X-ray, or by arranging two analyzing crystals has been conventionally known. In addition, there is such an instrument as allowing four analyzing crystals to be interlocked with gears in order to obtain high resolution (for example, JP-A-2005-140719).[0005]An X-ray wavelength measurement apparatus as disclosed in JP-A-2005-140719 irradiates radiation light as primary X-ray to a sample, and spectrally reflects fluorescent X-ray generated from the sample with four analyzing crystals in (+, −, −, +) arrangement to measure the intens...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G01T1/36
CPCG01N23/223G01N2223/076G21K2201/062G21K1/06
Inventor OMOTE, KAZUHIKO
Owner RIGAKU CORP
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