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75 results about "Crystal rotation" patented technology

Novel ferroelectric single-crystal lead ytterbium niobate-lead magnesium niobate-lead titanate

The invention relates to the growth, the structures and the properties of novel ferroelectric single-crystal lead ytterbium niobate-lead magnesium niobate-lead titanate. The crystal belongs to a perovskite structure, has an MPB region and has a chemical formula of (1-x-y)Pb(Yb1 / 2Nb1 / 2)O3-xPb(Mg1 / 3Nb2 / 3)O3-yPbTiO3 which is short for PYMNT or PYN-PMN-PT. By adopting a top crystal-seeded method, the crystal with large size and high quality can grow under the conditions that the growth temperature of the crystal is 950-1100 DEG C, the crystal rotation speed is 5-30rpm, and the cooling speed is 0.2-5 DEG C / day, and the grown crystal exposes a 001 natural growth surface. Through X-ray powder diffraction, the system is confirmed as the perovskite structure; and through ferroelectric, dielectric and piezoelectric measurement, the ferroelectricity, the dielectric property and the piezoelectricity of the crystal are analyzed. The crystal has high Curie temperature and trigonal-tetragonal phase transition temperature, large piezoelectric constant and electromechanical coupling factor, high dielectric constant and low dielectric loss and better heat stability. The crystal can be widely applied to devices in the piezoelectric fields of ultrasonically medical imaging, sonar probes, actuators, ultrasonic motors, and the like.
Owner:FUJIAN INST OF RES ON THE STRUCTURE OF MATTER CHINESE ACAD OF SCI

Closed monocrystalline growth furnace for molten salt method crystal growth

A closed monocrystalline growth furnace for the molten salt method crystal growth comprises a ceramic bushing hearth wound with a resistance wire, a closed barrel-shaped hollow double-layer stainless steel outer furnace shell positioned outside the hearth, fireproof heat-insulation bricks/cotton arranged between the furnace shell and the hearth, a thermocouple traversing the furnace shell and extending to the outer wall of the hearth, and a fireproof heat-insulation brick furnace cover covering the upper port of the hearth, wherein the center and two sides of the furnace cover are provided with a first vertical central through hole and observation holes respectively; cooling water which flows in a circulating manner is contained in the furnace shell; the wall of the furnace shell is provided with an aspirating hole and an air inlet; the center of the cover of the furnace shell is provided with a second vertical central through hole opposite to the first vertical central through hole, and quartz glass windows; an atmospheric gas is filled to the inside of the furnace shell; a magnetofluid is arranged over the furnace shell and is connected with the furnace shell through a bellow; and a seed crystal rod traverses the magnetofluid, is connected with a universal knot, and is fixed on a crystal rotation head through the universal knot. The furnace enables crystals to grow under the atmospheric gas, the entry of impurities into the crystals to be reduced, the optical properties of the crystals to be improved, the extrinsic absorption generated by the crystals in an ultraviolet spectrum region to be removed, and the ultraviolet laser output power to be improved.
Owner:TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI

Rapid ending method for Czochralski silicon

The invention discloses a rapid ending method for Czochralski silicon. The rapid ending method for Czochralski silicon comprises the following steps: in an early stage, stopping rising of a crucible,increasing the temperature of a thermal field, maintaining a crystal growth speed, a crystal rotation speed and a crucible rotation speed unchanged, and allowing a crystal diameter to decrease; in a middle stage, reducing the crystal growth speed, driving the crucible to rise, then reducing heating power, increasing the crystal rotation speed and the crucible rotation speed, and allowing the risetrend of the temperature of the thermal field to slow down; and in a later stage, stopping rising of the crucible, maintaining the crystal rotation speed and the crucible rotation speed unchanged, increasing the crystal growth speed, and lifting crystal out of the liquid level of molten silicon when the crystal diameter decreases to 25 to 30 mm so as to complete ending. The rapid ending method forCzochralski silicon can rapidly decrease the crystal diameter on the premise of maintaining the growth speed of monocrystal silicon crystals unchanged; then the method reduces the crystal growth speed, increases the crystal rotation speed and the crucible rotation speed, and decreases heating power to slow down the temperature rising trend of the thermal field, so the tail part of a crystal is prevented from break-off; and finally, a crystal pulling speed is rapidly increased to complete ending, so ending time is greatly shortened, and yield is substantially increased.
Owner:YINCHUAN LONGI SILICON MATERIALS

Monocrystalline silicon growth ultrasonic wave oxygen control method

The invention discloses a monocrystalline silicon growth ultrasonic wave oxygen control method. In a device of the monocrystalline silicon growth ultrasonic wave oxygen control method, the surface of silicon melt is provided with a set of ultrasonic wave, and a set of ultrasonic wave vibration heads are uniformly distributed on a circle coaxial to silicon single crystal rods and a crucible; the distance between each pair of ultrasonic wave vibration heads is controlled to be 1.5 to 2 times of the distance from a corresponding ultrasonic wave vibration head to the crucible wall; the ultrasonic wave vibration heads are made of a high-purity quartz material, and are stretched to be 10 to 15mm below the surface of the silicon melt; and the depth is maintained in the process of crystal growth. In silicon single crystal equal-diameter growth process, ultrasonic wave oscillation is introduced so as to inhibit heat natural convection in a high oxygen concentration zone around the crucible, accelerate flow of the silicon melt from the center to the surrounding caused by crystal rotation, promote volatilization of oxygen on a free surface, reduce solubility of Si-O gas in the silicon melt, promote volatilization of Si-O on the surface of the silicon melt, and control oxygen content of obtained crystals.
Owner:SHANGHAI ADVANCED SILICON TECH CO LTD

Processing process for preparing single crystal silicon through Czochralski method

The invention discloses a processing technology for preparing single crystal silicon by the Czochralski method, which comprises the following steps: necking growth: when the temperature of the silicon melt is stabilized to a certain temperature, the seed crystal is immersed in the silicon melt, and the seed crystal is Increase the pulling speed at a certain rate to reduce the diameter of the seed crystal to 3-7mm; shoulder growth: after the necking growth is completed, reduce the crucible temperature and pulling speed, adjust the crucible rotation speed and crystal rotation speed, and increase the crystal to the required diameter; equal-diameter growth: after the shoulder growth is completed, adjust the crucible temperature, pulling speed, crucible rotation speed and crystal rotation speed, so that the diameter of the ingot is maintained between plus and minus 2mm; the present invention adds pure boron to the single crystal silicon raw material, The mass ratio of pure boron to monocrystalline silicon raw materials is 5%-15%, so that the resistivity of monocrystalline silicon can reach 300Ω/CM, and the radial uniformity of resistivity is within 3%; reduce the oxygen content in silicon melt It effectively inhibits the entry of oxygen from the silicon melt into the silicon crystal, improves work efficiency, and reduces the oxygen content of the silicon crystal.
Owner:JIANGSU YONGJIA ELECTRONICS MATERIALS

Crystal rocking curve measurement method based on energy resolution detector

The invention relates to a crystal rocking curve measurement method based on an energy resolution detector, comprising the steps of 1, selecting an X-ray tube anode target material and voltage/current parameters based on an X-ray energy range {E} for measurement; 2, determining a Bragg diffraction angle range {theta B}, a crystal rotation angle range {theta T} and a rotation stepping angle; 3, measuring a crystal diffraction energy spectrum of each rotation angle within the {theta T}; 4, correcting the effect of scattering factors in the crystal diffraction energy spectrums; 5, extracting the diffraction strength of X-ray of energy Ej in {E} within a unit interval when theta Ti = theta Bi, so as to obtain a strength variation curve of Ej; 6, performing diffraction peak fitting on the strength variation curve; 7, figuring out a first-order derivative of a fitted diffraction peak, selecting absolute values of a part of the diffraction peak where the slope of the first-order derivative is not less than 0, i.e., the left and right branches of a rocking curve, and splicing to obtain the rocking curve of Ej; 8, repeating steps 5-7 until {E} is traversed, thereby obtaining the rocking curve of the X ray of all energies in {E} to a certain lattice plane of a crystal.
Owner:NORTHWEST INST OF NUCLEAR TECH

Shoulder-lifting edulcoration method in monocrystal production process

The invention relates to a shoulder-lifting edulcoration method in a monocrystal production process, and the method comprises the following steps: after one or two shoulders are lifted in the monocrystal production process, keeping the power value of a monocrystal furnace at shouldering power; amplifying the shoulder of which the edge is removed; automatically equalizing the diameter of 4-9cm; then, exiting an automatic isodiametric state, and changing into a manual state; increasing the power value to 60-90 kilowatts; keeping crystal rotation at 1-3 revolutions per minute and crucible rotation at 1-3 revolutions per minute; carrying out back melting on isodiametric polycrystal of which the length is 4-9 cm; after melting 50-70% of crystal, lowering the power value to 40-60 kilowatts; and slowly melting the crystal into a 'peach shape'. According to the shoulder-lifting edulcoration method, the crystal is melted from top to bottom so as to be slowly melted into a 'peach shape' which is easy to adsorb a great quantity of impurities, thereby playing a role in purifying a silicon fusant. According to the shoulder-lifting edulcoration method, shoulder lifting times are reduced, and the purposes of improving the monocrystal finished product rate and improving the production efficiency are achieved.
Owner:ZHEJIANG XINGYU ENERGY TECH

Continuous pulling monocrystalline silicon growth method

The invention provides a continuous pulling monocrystalline silicon growth method, and belongs to the field of semiconductor material preparation, wherein the method comprises the steps of material melting, stabilization, neck guiding, shoulder releasing, shoulder rotating, equal diameter and tail ending, wherein the material melting power is gradually increased and heated in the early stage, thematerial melting power in the medium stage is kept at the stable power, and the material melting power is reduced in the later stage; the rotating directions of crystal rotation and pan rotation are opposite in the stabilization process, the temperature of a thermal field is adjusted to the neck guiding temperature, and a feeding device is kept in a feeding state; the crystal growth speed is reduced in the shoulder releasing process, the feeding device is in the feeding state, and the feeding amount is gradually increased; the shoulder rotating process is increased on the basis of the shoulderreleasing; the given temperature in the early stage of the equal diameter process, and the temperature is controlled, and the temperature is reduced in the early stage. According to the continuous pulling monocrystalline silicon growth method, the feeding amount in the crystal growth crucible can be reduced, the continuous feeding of the monocrystalline furnace is achieved, the secondary feedingtime is reduced, the synchronous feeding and crystal growth are achieved, the initial crystal growth crystal source in the crucible is less, and the resistivity distribution is more uniform.
Owner:XINGTAI JINGLONG ELECTRONICS MATERIAL +1

Vertical laser interferometry device and method for measuring flat crystal absolute surface shape

The invention provides a vertical laser interferometry device and method for measuring a flat crystal absolute surface shape, and adopts a method of three-plane mutual inspection to measure the absolute surface shape of three flat crystal working faces. The device comprises the following parts of a device main body containing a laser emitter, a filter, a beam splitter, a collimating lens, an imaging objective lens, an image detector and a processing portion; a reference flat crystal carrying device located directly under the collimating lens and disposed with the same optical axis of the collimating lens for carrying the flat crystal as a reference flat crystal; and a flat crystal rotation carrying device located directly under the reference flat crystal carrying device and disposed with the same optical axis of the reference flat crystal carrying device for carrying the flat crystal as the flat crystal to be tested, wherein the flat crystal rotation carrying device has a fixed disk, arotation carrying portion and a defining portion, and the defining portion is used for limiting the rotating disk to the first position when the rotating disk is switched to a first position and limiting the rotating disk to the second position when the rotating disk is switched to a second position.
Owner:苏州慧利仪器有限责任公司

Ce3xGy3(1-x-y)Y3yAl5O12 doped garnet high-temperature scintillation crystal and preparation method thereof

The invention relates to a Ce3xGy3(1-x-y)Y3yAl5O12 doped garnet high-temperature scintillation crystal and a preparation method thereof. The chemical formula of the crystal is Ce3xGy3(1-x-y)Y3yAl5O12, the processing steps are as below: the Ce3xGy3(1-x-y)Y3yAl5O12 crystal is grown with a medium-frequency induction heating pulling method, a heating unit is an iridium crucible, the raw materials are weighed according to proportion after calcination, the raw materials are pressed into blocks by a static pressure machine after weighing, matching and uniform grinding and mixing, sintering is performed at the temperature of 1,300 DEG C and solid-phase reaction happens, and the sintered raw materials are preserved in a drying cabinet; zirconium oxide and aluminum oxide are used as an insulation cover and an insulation material respectively, an observation hole is sealed by a gem piece, the inside of a hearth is protected by inert gas, the crystal growth temperature is about 1,950 DEG C, the pulling rate is 0.5-5 mm/h, and the crystal rotation speed is 10-30 rpm. The crystal has the advantages that the crystal growth cost is low, large size is easy to prepare, high-concentration doping is realized, the scintillation property is excellent and the like.
Owner:SUZHOU SIHAI CHANGJING PHOTOELECTRIC MATERIAL
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