The invention relates to a SiC
single crystal, a
SiC substrate, and a SiC epitaxial
wafer. The purpose of the present invention is to provide a SiC
single crystal capable of reducing the
basal plane dislocation density. In the SiC
single crystal according to the present embodiment, lattice planes measured along a first straight line, a second straight line, a third straight line, a fourth straight line, a fifth straight line, and a sixth straight line are each curved in a convex shape, and in the lattice planes measured along the first straight line, the second straight line, the third straight line, the fourth straight line, the fifth straight line, and the sixth straight line, the first straight line, the second straight line, the third straight line, the fourth straight line, the fifth straight line, and the sixth straight line are curved in a convex shape. The first straight line, the second straight line, the third straight line, the fourth straight line, the fifth straight line, and the sixth straight line respectively pass through the center in plan view from the thickness direction and are inclined by 30 degrees one by one with respect to the center.