91 results about "Small-angle X-ray scattering" patented technology

Periodic spatial patterns of x-ray illumination are used to gather information about periodic objects. The structured illumination may be created using the interaction of a coherent or partially coherent x-ray source with a beam splitting grating to create a Talbot interference pattern with periodic structure. The object having periodic structures to be measured is then placed into the structured illumination, and the ensemble of signals from the multiple illumination spots is analyzed to determine various properties of the object and its structures. Applications to x-ray absorption / transmission, small angle x-ray scattering, x-ray fluorescence, x-ray reflectance, and x-ray diffraction are all possible using the method of the invention.

An ink jet ink is disclosed which includes water, a water-soluble organic solvent and a coloring material and has excellent properties. The coloring material is a specific phthalocyanine derivative and is contained in a specific amount in the ink. The water-soluble organic solvent includes a specific amount of 2-pyrrolidone. In addition, a d75 value is in a specific range where the d75 value corresponds to 75% of a dispersion distance distribution, measured by a small angle X-ray scattering method, of molecular aggregates in the ink jet ink whose coloring material concentration is adjusted to 0.5 mass %.

Methods and systems for characterizing dimensions and material properties of high aspect ratio, vertically manufactured devices using transmission, small-angle x-ray scattering (T-SAXS) techniques are described herein. Exemplary structures include spin transfer torque random access memory (STT-RAM), vertical NAND memory (V-NAND), dynamic random access memory (DRAM), three dimensional FLASH memory (3D-FLASH), resistive random access memory (Re-RAM), and PC-RAM. In one aspect, T-SAXS measurements are performed at a number of different orientations that are more densely concentrated near the normal incidence angle and less densely concentrated at orientations that are further from the normal incidence angle. In a further aspect, T-SAXS measurement data is used to generate an image of a measured structure based on the measured intensities of the detected diffraction orders. In another further aspect, a metrology system is configured to generate models for combined x-ray and optical measurement analysis.

Methods and systems for performing simultaneous X-ray Fluorescence (XRF) and small angle x-ray scattering (SAXS) measurements over a desired inspection area of a specimen are presented. SAXS measurements combined with XRF measurements enables a high throughput metrology tool with increased measurement capabilities. The high energy nature of x-ray radiation penetrates optically opaque thin films, buried structures, high aspect ratio structures, and devices including many thin film layers. SAXS measurements of a particular location of a planar specimen are performed at a number of different out of plane orientations. This increases measurement sensitivity, reduces correlations among parameters, and improves measurement accuracy. In addition, specimen parameter values are resolved with greater accuracy by fitting data sets derived from both SAXS and XRF measurements based on models that share at least one material parameter. The fitting can be performed sequentially or in parallel.

An ultra-small angle X-ray scattering measuring apparatus includes a detector for detecting X-rays emitted from a sample, an X-ray collimating mirror arranged between the X-ray real focus and the sample, a monochromator arranged between the X-ray collimating mirror and the sample and an analyzer arranged between the sample and the detector. The X-ray collimating mirror includes a pair of X-ray mirrors that are arranged orthogonally relative to each other. The X-ray mirrors are multilayer film mirrors and their X-ray reflection surfaces are paraboloidal. The interplanar spacing of lattice planes of each of the multilayer films is continuously changed along the paraboloid so as to meet the Bragg's condition. The monochromator and the analyzer are formed by using a channel-cut crystal. The analyzer is driven to rotate for scanning around a 2θ-axial line and diffracted rays reduced to a spectrum by the analyzer are detected by the detector.

An ink jet ink which can form images whose bleeding resistance is high and whose bronzing phenomenon is suppressed, is provided. The ink is an ink jet ink for use together with a pigment ink. The ink jet ink is characterized in that: the ink jet ink contains a coloring material, a polyvalent metal and a water-soluble organic solvent(s); the coloring material is at least a compound represented by the general formula (I); a content (mol / g) of the polyvalent metal is 2.0×10−6 mol / g or more and 4.0×10−4 mol / g or less; a total content (mass %) of the water-soluble organic solvent(s) is 25.0 mass % or more with respect to the total mass of the ink; and in a dispersion distance distribution, measured by a small angle X-ray scattering method, of molecular aggregates in the ink jet ink whose coloring material concentration is adjusted to 0.5 mass %, a dispersion distance d75 value corresponding to 75% of a distribution is 12.60 nm or less.

This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and / or measurement throughput. This may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.

A light conversion composite including a matrix resin and quantum dot-polymer beads dispersed within the matrix resin. The light conversion composite has a wave number q of 0.0056 angstrom-1 to 0.045 angstrom-1 at a peak point in a scattering intensity graph according to wave numbers measured by using small angle X-ray scattering.

The invention discloses a mesoporous high polymer or carbon / silicon oxide nano-composite material with a three-dimensional pore canal structure. The mesoporous high polymer or carbon / silicon oxide nano-composite material is prepared by mixing PDMS-PEO (Polydimethylsiloxane-Poly Ethylene Oxide) and F127 serving as mixed structure directing agents and a phenolic resin performed polymer Resol serving as a carbon source precursor and reacting to obtain an As-made intermediate, and calcining, wherein crystal diffraction peaks of 110, 200, 211, 220, 310, 222 and 321 are shown in the small angle X ray scattering (SAXS) map of the As-made intermediate, and the q value ratio of the diffraction peaks is shown in the specifications. The specific surface area of the mesoporous carbon / silicon oxide nano-composite material with a three-dimensional cubic Imm pore canal structure is 650-1,600m<2> / g, the pore volume range is 0.45-0.63 cm<3> / g, the pore size is 5.0-6.2 nanometers, and the stability of a mesoporous material framework is up to 900 DEG C. The high polymer or carbon / silicon oxide nano-composite material provided by the invention is particularly suitable for the fields of super capacitor electrode materials, adsorbents, catalyst carriers, separation of biomolecules, gas-sensitive materials, optoelectronic devices, hydrogen storage and the like.

The present invention relates to an anti-reflective film exhibiting one or more peaks at a scattering vector (qmax) of 0.0758 to 0.1256 nm−1, in a graph showing a log value of scattering intensity to a scattering vector defined in small-angle X-ray scattering.