In-situ device for small-angle X-ray scattering experiment

An X-ray, in-situ technology, applied in the field of measuring instruments, can solve the problems of incompatibility with the limited space of synchrotron radiation X-ray scattering line stations, unsuitable samples, low temperature, etc., and achieves good application prospects, simple structure, and high measurement accuracy. Effect

Active Publication Date: 2017-01-04
SHANGHAI INST OF APPLIED PHYSICS - CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

This type of device either has low stress and low temperature, or the sample is exposed to the air during the experiment. For ceramics, graphite, rocks, etc., samples that require greater stress loading, higher heating temperature, and vacuum or atmosphere protection Not applicable
[0004] At present, there are also some devices that can heat and stress the sample in a vacuum or atmosphere protection environment. However, such devices are generally large in size and cannot be compatible with the limited space of the synchrotron radiation X-ray scattering station; more importantly, the original The bit device needs to be compatible with the optical path of the X-ray beam used for small-angle X-ray scattering, so a special and ingenious optical path structure design is required, which is not available in the above-mentioned existing devices

Method used

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  • In-situ device for small-angle X-ray scattering experiment
  • In-situ device for small-angle X-ray scattering experiment
  • In-situ device for small-angle X-ray scattering experiment

Examples

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Embodiment 1

[0031] The basic structure of the in-situ device in this embodiment is as follows figure 1 , figure 2 shown, where figure 2 Left side view of the whole device. The in-situ device can be functionally divided into: vacuum and atmosphere protection system, stress loading and measuring system, temperature loading and measuring system. like figure 1 As shown, the vacuum and atmosphere protection system includes a water cooler 11, an airtight chamber 12, a sample loading flange 13, a vacuum pump 14, and a support 15; the stress loading system includes a power source 21, a stress measurement module 22, and a bellows dynamic seal 23 , transmission rod 24, hinge 25, U-shaped sample holder 26, T-shaped sample holder 27, top-like key 28, power control module 29, stress reading module 210; the temperature loading and measurement system includes a resistance furnace 31. A resistance furnace temperature measurement module 32, a sample temperature measurement module 33, a resistance fu...

Embodiment 2

[0042] The structure of this embodiment is the same as that of Embodiment 1, the difference is that the power source 21 selects an electric thrust rod with a rated force of 1 kN and a stroke of 10 mm, the measurement range of the stress measurement module 22 is 0-1 kN, and the measurement accuracy is 2N ; U-shaped sample holding member 26, T-shaped sample holding member 27 and top sample key 28 constitute the sample holding mechanism, which can place samples with a thickness of 3 mm and a width of 8 mm.

[0043] In this example, the stress loading accuracy of the sample can reach 0.1 MPa, the stress loading range is 0~40 MPa, and the temperature loading range is room temperature~1100 o C, the degree of vacuum can reach 2Pa. This embodiment can be used for heating and stressing small-angle X-ray scattering experiments on porous materials and geotechnical samples with low compressive strength but high measurement accuracy.

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Abstract

The invention discloses an in-situ device for small-angle X-ray scattering experiment. The in-situ device comprises a vacuum and atmosphere protection system, a stress load and measurement system and a temperature load and measurement system. Self-alignment of samples during stress load is realized in the stress load system by adopting design of pull-press stress transformation. Special design is adopted in the temperature load and measurement system, wide X-ray channels are realized while uniform of temperature field is guaranteed, and meanwhile, heating temperature of the samples can reach 1100 DEG C. By the arrangement, the in-situ device is simple in structure, reliable in performance, high in measurement accuracy and capable of loading in temperature and stress simultaneously on the samples under the vacuum or atmosphere protection environment. The in-situ device is used in cooperation with a synchrotron-radiation small-angle X-ray scattering line station, in-situ measurement of to-be-measured samples on microscopic deformation, damage and fracture process under the mechanics use environment can be performed, and an effective and reliable measurement method for discovering changes of deformation and microstructure of brittle material samples under the stress is provided.

Description

technical field [0001] The invention relates to the technical field of measuring instruments, in particular to an in-situ device for small-angle X-ray scattering experiments. Background technique [0002] Small-angle X-ray scattering is a structural analysis method different from wide-angle diffraction, and is a very important method for measuring nanostructures. When using this method to analyze nanostructures in solid materials, especially ceramics, rocks and graphite, it is often necessary to perform stress loading and heating tests on the samples. In order to protect the samples from oxidation and the reaction atmosphere required for the experiments, it is also necessary Maintain the vacuum or atmosphere environment of the sample, for example, to study the change process of nano-pores in ceramics during sintering, the change process of nano-inclusions in rock under stress and high temperature environment, and the behavior of microcracks in graphite under stress and high ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/201
CPCG01N23/201
Inventor 贺周同曾建荣田丰唐辉戚威汪雪张灿夏汇浩
Owner SHANGHAI INST OF APPLIED PHYSICS - CHINESE ACAD OF SCI
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