Undercoat agent and method of forming pattern of layer containing block copolymer

Abstract

An undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, wherein the undercoat agent contains a resin component, the resin component includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer, including: a step (1) in which the undercoat agent is applied to a substrate to form a layer containing the undercoat agent; a step (2) in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and a step (3) in which a phase containing at least one block of the plurality of blocks constituting the block copolymer is selectively removed.

Description

TECHNICAL FIELD[0001]The present invention is related to an undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, and a method of forming a pattern of a layer containing a block copolymer by using the undercoating agent.[0002]Priority is claimed on Japanese Patent Application No. 2012-057693, filed Mar. 14, 2012, and Japanese Patent Application No. 2013-020932, filed Feb. 5, 2013, the contents of which are incorporated herein by reference.BACKGROUND ART[0003]Recently, as further miniaturization of large scale integrated circuits (LSI) proceeds, a technology for processing a more delicate structure is demanded. In response to such demand, an attempt has already been started in which a fine pattern is formed using a phase-separated structure formed by self-assembly of a block copolymer having mutually incompatible blocks bonded together.[0004]For using a phase separation of a block copolymer, i...

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Benefits of technology

[0015]As a result of intensive investigation, the inventors of the present invention discovered that by using an undercoat agent having a specific resin component for performing phase separation of a layer containing a block copolymer, a favorable pattern could be obtained by phase separation without having to control the surface free energy of the layer composed of the undercoat agent, and they also found that a layer composed of the undercoat agent could be formed as a thin film, and they were thus able to complete the present invention.

[0029]According to the undercoat agent of the present invention, by using phase separation of a block copolymer, a substrate provided with a nanostructure on the surface thereof can be simply produced, wherein the nanostructure is more freely designed with respect to the positioning and the orientation thereof. Moreover, when the undercoat agent of the present invention is used, a film having the aforementioned function can be formed as a comparatively thin film on the substrate, and therefore the effects of the layer composed of the undercoat agent on later steps is minimal, and removal of the layer composed of the undercoat agent is comparatively simple.

[0030]Further, in the pattern formation method for a layer containing a block copolymer according to the present invention, by using the undercoat agent mentioned above, a substrate provided with a nanostructure on the surface thereof can be produced, wherein the nanostructure is designed more freely with respect to the positioning and the orientation.

Problems solved by technology

However, as described in Non-Patent Document 2 which discloses that the film thickness of the lower-layer film is 5 to 100 nm, crosslinking by heating causes a problem that the film thickness of the lower-layer film increases.

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