Metal nanoparticle enhanced semiconductor film for functionalized textiles

Abstract

A method for forming a metallic nanoparticle and semiconductor coated fiber material is provided. The method can include the steps of coating at least one surface of a material, for example a textile material, with a semiconducting layer, and growing metallic nanoparticles on the semiconducting layer. The steps for coating the surface of the material with a semiconducting layer can include forming a titanium dioxide film on the surface of the textile material. The steps for forming metallic nanoparticles on a semiconducting layer can include immersing the coated textile layer in a metallic nanoparticle precursor solution, drying the coated textile layer and exposing the textile layer to UV radiation. The metallic nanoparticles can include gold and / or silver nanoparticles. Also disclosed are materials having a least one treated surface coated with metallic nanoparticles. The treated surface may comprise the surface of a textile material treated according to the methods provided herein.

Description

GOVERNMENT LICENSE RIGHTS[0001]This invention was made with government support under D01_W911SR-14-2-0001-0003 awarded by the Department of Defense. The government has certain rights in the invention.CROSS REFERENCE TO RELATED APPLICATIONS[0002]NoneFIELD OF THE INVENTION[0003]This invention relates to the field of surface coatings and methods for providing a surface coating to a material, as a method of treating a material, for example a textile material, such that at least one surface of the material comprises a nanostructured coating is provided. The invention also relates to the field of nanostructured coatings that are self-cleaning, anti-microbial, and radiation-protective. The invention further relates to the field of semiconducting metal oxide thin film coatings, as semiconducting metal oxide thin film coating comprising metallic nanoparticle incorporated to a semiconducting film is provided, the film providing an active photocatalyst layer imparting the above characteristics...

AI Technical Summary

Benefits of technology

The method produces textiles with improved self-cleaning, anti-microbial, and UV-protective properties, demonstrating enhanced photocatalytic performance and stability, with the ability to maintain consistent activity over multiple cycles and resist degradation.

Problems solved by technology

Treatment methods that rely on semiconducting materials being deposited on a textile typically rely on complicated methods ill-suited to scaling to industrial scale, and also typically yield a textile material that is impregnated by and / or decorated with discrete semiconductor nanotubes or nanoparticles, which both have the disadvantage of being more readily removed from the fabric and less photocatalytically active than a thin, uniform film.

While advancements have been made in the development of advanced textile materials with a photocatalytic film or layer, current methods and techniques are inadequate because they are ill-suited to large scale production and they have limited self-cleaning, anti-microbial, and radiation-protective properties.

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