Semiconductor photosensitive unit and semiconductor photosensitive unit array thereof
a technology of semiconductor photosensitive units and semiconductor photosensitive units, which is applied in the direction of diodes, semiconductor devices, radio frequency controlled devices, etc., can solve the problems of low product pixel, difficult integration with a peripheral circuit, and high production cost, so as to prevent leaking charges, increase the charge storage time of floating gates, and increase the dynamic range of operating voltage
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first embodiment
[0041]FIG. 5 is a cross-sectional diagram of the semiconductor photosensitive unit in the present invention as illustrated by the equivalent circuits in FIG. 3 and FIG. 4. As shown in FIG. 5, the semiconductor photosensitive unit of the present invention includes a doped well 301 of the second conductivity type formed in a semiconductor substrate 200 of the first conductivity type, and the semiconductor substrate 200 includes, but is not limited to, a silicon substrate, a germanium substrate, a silicon germanium substrate, or a silicon-on-insulator substrate; a diffusion region 304 and a photosensitive region 201 of the first conductivity type are disposed in the doped well 301 of the second conductivity type, a second current channel region is formed in the part of the semiconductor substrate between the diffusion region 304 and the photosensitive region 201 of the first conductivity type, and a third-layer insulation film 302 and a second control gate 303 are sequentially disposed...
second embodiment
[0050]FIG. 6 is a cross-sectional diagram of the semiconductor photosensitive unit in the present invention provided based on the two equivalent circuits of the semiconductor photosensitive unit in the present invention illustrated in FIG. 3 and FIG. 4. The semiconductor photosensitive unit illustrated in FIG. 6 is an improvement to the structure of the semiconductor photosensitive unit illustrated in FIG. 5. In the semiconductor photosensitive unit illustrated in FIG. 5, the floating gate 404 is electrically connected to the diffusion region 304 of the first conductivity type by the electrical connection line 400, while in the semiconductor photosensitive unit illustrated in FIG. 6, the floating gate 404 of the first conductivity type directly extends onto the diffusion region 304 of the first conductivity type and contacts the diffusion region 304 of the first conductivity type, such that the floating gate 404 of the first conductivity type is directly connected to the diffusion r...
third embodiment
[0051]FIG. 7 is a three-dimensional structural diagram of the semiconductor photosensitive unit in the present invention provided based on the two equivalent circuits of the semiconductor photosensitive unit in the present invention illustrated in FIG. 3 and FIG. 4. The semiconductor photosensitive unit illustrated in FIG. 7 is an improvement to the structure of the semiconductor photosensitive unit illustrated in FIG. 6. In the semiconductor photosensitive unit illustrated in FIG. 6, the first current channel region and the second current channel region are of a parallel structure; while in the semiconductor photosensitive unit illustrated in FIG. 7, the first current channel region and the second current channel region are of a vertical structure. Compared with the semiconductor photosensitive unit illustrated in FIG. 6, it is easier to control the manufacturing process of the semiconductor photosensitive unit illustrated in FIG. 7.
[0052]FIG. 8 and FIG. 9 are two equivalent circui...
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