The invention relates to the technical field of
nano devices, in particular to a
nano device structure and a preparation method thereof, and the
nano device structure comprises a substrate, a shallow slot isolation region, a
nanosheet channel, a
metal gate, a source
electrode and a drain
electrode; the
nanosheet channel is located above the substrate, and the
metal gate surrounds the
nanosheet channel; the
shallow trench isolation regions are positioned on two sides of the substrate; the source and drain electrodes are connected with the nanosheet channel; a side wall structure is arranged between the source and drain electrodes and the
metal gate; the source and drain
electrode comprises a bottom source and drain electrode and a top source and drain electrode, an
isolation layer is arranged between the bottom source and drain electrode and the top source and drain electrode, and a step-shaped structure is formed between the layer where the top source and drain electrode is located and the
isolation layer. By preparing the step-shaped complementary
field effect nano device structure, the source electrode and the drain electrode can be interconnected upwards, and the unit area of the device is effectively reduced; and the bottom device
interconnection line does not influence the channel region, so that the current intensity is not reduced.