Microreactor and method of producing the same
A technology of micro-reactors and manufacturing methods, applied in chemical instruments and methods, chemical/physical/physical-chemical fixed reactors, electrochemical generators, etc., capable of solving obstacles, low reaction efficiency, and reducing operating cost obstacles, etc. , to achieve the effects of reduced manufacturing costs, high thermal conductivity, and high space efficiency
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no. 2 Embodiment approach
[0097] Fig. 4 is a longitudinal sectional view corresponding to Fig. 2 of another embodiment of the microreactor of the present invention. In FIG. 4, the microreactor 1' of the present invention has a metal substrate 2'; a fine groove portion 3 formed on one side 2'a of the metal substrate 2'; The insulating film 4' on the 2'b; the heating element 5 provided on the surface 2'b of the metal substrate 2' through the insulating film 4'; the catalyst C placed in the micro groove 3; to cover the above micro groove part 3 The state of bonding the cover member 8 on the metal substrate 2'. Further, electrodes 6 and 6 are formed on heating element 5 , and heating element protective layer 7 having openings 7 a and 7 a exposing these electrodes 6 and 6 is provided to cover heating element 5 . Moreover, the said cover member 8 is provided with the raw material introduction port 8a and the gas discharge port 8b.
[0098] This microreactor 1' is the same as the above-mentioned microproces...
Embodiment approach
[0213] 30 and 31 are process diagrams illustrating an embodiment of the microreactor manufacturing method of the present invention.
[0214] In FIG. 30 and FIG. 31 , the microreactor 1 described above will be described as an example. In the manufacturing method of the present invention, first, the fine groove portion 3 is formed on the surface 2a of the metal substrate 2 (FIG. 30A). The fine groove portion 3 can be formed by forming a resist having a specific opening shape on the surface 2a of the metal substrate 2, and using the resist as a mask to perform wet etching to leave the comb-shaped flanges 2A and 2B. The metal substrate 2 is etched to form the metal substrate 2 without micromachining. The material of the metal substrate 2 used may be, for example, the following Al, Si, Ta, Nb, V, Bi, Y, W, Mo, Zr, Hf, etc. which can be anodized by an anodization process.
[0215] Thereafter, the metal substrate 2 on which the fine grooves 3 are formed is anodized to form a metal ...
no. 3 Embodiment approach
[0233] 34 to 38 are process diagrams for explaining an embodiment of the microreactor manufacturing method of the present invention using the above-mentioned microreactor 11 as an example. In addition, each drawing shows the cross-sectional shape at the position corresponding to FIG. 6, FIG.
[0234] In the manufacturing method of the present invention, first, through-holes 19 are formed simultaneously with fine grooves 13 on one surface 12 a of metal substrate 12 ( FIGS. 34A and 34B ). In the fine groove portion 13, a resist having a specific opening pattern corresponding to the fine groove portion 13 is formed on the surface 12a of the metal substrate 12, and a resist having an opening pattern for forming the through hole 19 is formed on the surface 12b of the metal substrate 12. of resist. Then, the metal substrate 12 is half-etched from the surface 12a side by etching the resist as a mask to leave the comb-shaped flanges 12A and 12B to form the fine grooves 13, and at the...
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Abstract
Description
Claims
Application Information
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