Antireflection film and process for producing the same
An anti-reflection film and film substrate technology, applied in optics, instruments, optical components, etc., can solve problems such as influence
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Embodiment 1
[0076] 1 g of citric acid was dissolved in 179 g of ion-exchanged water in a four-necked bottle, and 10 g of heptadecafluorodecylmethyldimethoxysilane was slowly added to the obtained solution, and stirred for 10 minutes after all the addition. While stirring, 100 g of hollow silica particle IPA dispersion sol (solid content 20%, manufactured by Catalyst Kasei Co., Ltd.) with an average particle diameter of 60 nm was gradually mixed in small amounts into this solution, and the liquid temperature was kept at 60° C. The particles were surface-treated by stirring for 2 hours. After the treatment, the solvent was removed by an evaporator, and then dried at 120° C. for 2 hours in a nitrogen atmosphere. About 20 g of surface-treated hollow silica particles (S-1) were obtained.
[0077] Next, 900 g of methanol, 300 g of ethanol, 550 g of ion-exchanged water, and 50 g of ammonia water at a concentration of 2% by weight were added to the flask, and after stirring for 1 hour, 162 g of ...
Embodiment 2
[0083] 5 g of the main coating agent (C) produced in the same manner as in Example 1 was mixed with 49.9 g of MIBK and 0.12 g of an isocyanate hardener, and stirred for 10 minutes to prepare a coating solution (E) with a solid content concentration of 2.0%. The coating solution (E) was applied with a Meyer bar, and dried at a temperature of 150° C. for 1 minute to allow a hardening reaction to proceed to obtain a low refractive index layer. The rod number of the Meyer rod was adjusted so that the film thickness was 102 nm, and the antireflection film was optimized. As a film base material, a polyethylene naphthalate (hereinafter sometimes referred to as PEN) film (manufactured by Teijin DuPont Film Japan Co., Ltd., trade name Q65-100) was used. The in-plane average refractive index of the PEN film used was 1.74. The characteristics of the obtained antireflection film are shown in Table 1.
Embodiment 3
[0085] A commercially available main coating agent (F) for forming a low-refractive index layer (produced by Nippon Shokubai Co., Ltd., commercial product) mainly composed of hollow silica particles modified with a fluoroorganic compound and a silane coupling agent 5 g of PX2-LR7) was mixed with 66.2 g of MIBK and 0.12 g of isocyanate curing agent, and stirred for 10 minutes to prepare a coating liquid (G) having a solid content concentration of 1.5%. Except having used this coating liquid (G) instead of coating liquid (D), the operation similar to Example 1 was repeated. Table 1 shows the characteristics of the obtained antireflection film.
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