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Method for manufacturing achromatic light variation image

A manufacturing method and achromatic technology, applied in optics, nonlinear optics, microlithography exposure equipment, etc., can solve the problems of expensive design and manufacturing costs, long manufacturing time, and large equipment investment, and achieve large design space and flexibility. sexual effect

Active Publication Date: 2009-03-11
SUZHOU UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] At present, electron beam (e-beam) and laser direct writing (LDW) are two main methods of producing precision graphics. The former has high etching resolution, but the equipment investment is large, the design and production costs are expensive, and the production time is long; Laser direct writing is a relatively fast mask generation method. When used to make line structure graphics, it has the advantages of simple manufacturing process, fast speed, low processing cost and large area.

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  • Method for manufacturing achromatic light variation image
  • Method for manufacturing achromatic light variation image
  • Method for manufacturing achromatic light variation image

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Embodiment 1

[0065] Embodiment one: referring to shown in accompanying drawing 2, a kind of manufacturing method of achromatic optical change image, with the directional diffraction phase structure unit as the pixel element of OVD, the orientation of the phase unit and the space frequency can be determined by the orientation and the width of the slit The directional speckle generator is constructed, and phase structures with different spatial frequencies and different orientations are designed by the computer. Attached Figure 2-1 shows a database constructed from this, which stipulates that the orientation φ of the OVD pixel element is -89°~90°, which is changed every 5°. Arranged into a 6×6 two-dimensional array. In fact, the change value of φ can be set arbitrarily, and arranged into two-dimensional templates with different combinations. The orientation of the pixel elements in each small-area area in the optically variable image shown in Fig. 2-2 is from -89° to 90°. Adopt SVG-LDW04 s...

Embodiment 2

[0066] Embodiment two: referring to accompanying drawing 3 to shown in accompanying drawing 5, when the OVD of making is in a certain area pixel element φ, Λ are identical (can be referred to as the plane unit of OVD), according to embodiment one The production method needs to repeatedly call the phase structure template of the same orientation. Assuming that the size of the pixel unit is p×q, for an M×N planar pattern, the phase units of the same orientation need to be called repeatedly to form an (M / p)×(N / q) array. Let the transmittance function of the phase unit be t 0 (u 0 , v 0 ), then the transmittance t(u 0 , v 0 )for,

[0067] t ( u 0 , v 0 ) = t 0 ( u 0 , v 0 ...

Embodiment 3

[0077] Embodiment 3: See accompanying drawings 6 to 10. We noticed that any small part of the phase structure can reproduce the target image, but the reproduced light intensity will weaken as the area decreases. If the area of ​​the surface element in the OVD is small, as shown in Figure 6-1, 6-3, this area only accounts for 1 / 16 of the whole phase figure, and the OVD is made by the method of calling the figure (embodiment two) at the specified position, and the diffraction light intensity Low, as shown in Figure 6-2, 6-4, the diffraction efficiency is only 2%. For the facet unit, this embodiment proposes a third data scheme, in which a corresponding directional diffraction phase structure is designed according to the shape and size of the facet unit. If the surface unit is a regular pattern, the size of the phase structure is equal to the size of the sub-image surface unit, as shown in Figure 7-1, which is a directional diffraction phase structure designed based on a small a...

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Abstract

The invention discloses a method to make achromat light altering image that includes the following steps: constructing directional speckle generator, using the narrow diaphragm on different direction as target matter light source, calculating the binary phase structure to use as micro structure of light altering image; using the generator to take digital expression; using laser imaging system to take laser write through by space light adjustor to gain the achromat light altering image. The invention has high resolution, and is suited to take hot pressing copying technology.

Description

technical field [0001] The invention relates to a method for realizing an optically variable image, in particular to a method for realizing an achromatic optically variable image designed by applying a binary optical method and using a laser direct writing method. Background technique [0002] As an advanced optical anti-counterfeiting technology, Optical Variable Device (OVD) is widely used in physical carriers such as currency, visas, ID cards, top-secret documents, and packaging materials. At present, optically variable images are mainly realized based on the directional diffraction effect of high-space frequency diffraction gratings. OVD is composed of grating elements with different orientations and different space frequencies. Under white light illumination, an off-axis rainbow effect is produced. However, in many applications, color will become an unfavorable factor. Therefore, how to realize achromatic light-variable images has become a research hotspot in the develo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/01
Inventor 周小红陈林森魏国军邵洁解剑锋沈雁
Owner SUZHOU UNIV