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Single phase fluid imprint lithography method

A viscous fluid, gas technology, applied in separation methods, liquid degassing, chemical instruments and methods, etc., can solve problems such as pattern deformation

Active Publication Date: 2009-04-29
MOLECULAR IMPRINTS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A concern with these processes above is the pattern distortion due to the presence of gas near the flowable region

Method used

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  • Single phase fluid imprint lithography method
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  • Single phase fluid imprint lithography method

Examples

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Embodiment Construction

[0020] figure 1 Illustrated is a lithography system 10 in accordance with one embodiment of the present invention that includes a pair of spaced apart bridge supports 12 with a bridge 14 and a platform support 16 extending therebetween. The bridge 14 and the platform support 16 are spaced apart from each other. Coupled to the bridge 14 is an inscription head 18 which extends from the bridge 14 to the platform support 16 and provides movement in the direction of the Z axis. A moving platform 20 is placed on the platform support 16 facing the marking head 18 . The motion platform 20 is configured to be movable relative to the platform support 16 along the X and Y axes. It should be appreciated that imprint head 18 can provide motion along the X and Y axes as well as motion along the Z axis, while motion platform 20 can provide motion along the Z axis as well as motion along the X and Y axes. An example of a moving platform arrangement is disclosed in U.S. Patent Application 1...

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Abstract

The present invention relates to a method of reducing pattern distortion on an imprinted layer by reducing air bubbles in a viscous fluid layer on a pad. To this end, the method includes altering the transport conditions of the gas adjacent to the viscous fluid. Specifically, the environment near the pattern-replicating pad is filled with a gas that is either highly soluble, highly dispersible, or both, relative to the viscous fluid in which it is placed. Additionally, or as an alternative to gas-filling the environment as described above, the pressure of the environment may be reduced.

Description

technical field [0001] The field of the invention relates generally to imprint lithography. More specifically, the present invention aims to reduce pattern distortion during the imprint lithography process by reducing, if not eliminating, gas in the imprint layer. Background technique [0002] Microfabrication includes the fabrication of very small structures, such as structures with patterned features on the micron scale or smaller. One area where microfabrication has had considerable influence is in integrated circuit processing. Microfabrication is becoming increasingly important as the semiconductor processing industry continues to pursue greater throughput and increase the number of circuits per unit area that can be formed on a substrate. Microfabrication offers greater process control while enabling smaller and smaller minimum feature sizes for forming structures. Other fields using microfabrication include biotechnology, optical technology, mechanical systems, etc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D19/00C23F1/00B29C59/02G03FG03F7/00
CPCB82Y10/00Y10S438/909G03F7/0002Y10S425/815B82Y40/00Y10S425/06B81C1/0046H01L21/0274
Inventor I·M·麦克麦基N·A·斯塔西D·A·巴布斯D·J·沃斯M·P·C·瓦茨V·N·柴斯盖特F·Y·徐R·D·弗伊欣P·B·拉德
Owner MOLECULAR IMPRINTS