Exposure device
A technology of exposure device and exposure chamber, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, electrical components, etc., can solve the problems of high cooling medium price, complex structure, easy adhesion, etc., to maintain lens characteristics, prevent Illumination unevenness, labor-saving effects
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[0049] Next, embodiments of the present invention will be described in detail with reference to appropriate drawings. figure 1 It is a plan view of the overall structure of the exposure apparatus of this embodiment. figure 2 for figure 1 A cross-sectional view of the exposure apparatus shown along line A-A. image 3 It is a partially cutaway perspective view of the light source chamber seen from the exposure chamber side.
[0050] Such as figure 1 As shown, the exposure device 1 mainly includes in the cavity (chamber) 5: a light source chamber 2; a processing chamber for exposing the substrate with irradiation light, that is, an exposure chamber 3; Optical system on the road (mirror 41 etc., refer to figure 2 ). A temperature adjustment unit 51 (air blower) is provided in the cavity 5 through a duct 52 attached to the upper portion thereof. The temperature adjustment unit 51 can supply cooling air into the cavity 5 and discharge it. Therefore, a certain air supply pa...
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