Adhesive sheet, semiconductor device, and method for producing the semiconductor device
A technology of adhesive sheets and semiconductors, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, adhesives, etc., and can solve the problems of semiconductor chip end damage becoming larger and filamentous chips becoming larger
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0100] Epoxy resin uses bisphenol F type epoxy resin (using epoxy equivalent 160, Dongdu Chemicals Co., Ltd. product name YD-8170C) 30 parts by weight, and cresol novolak type epoxy resin (using epoxy equivalent 210, Dongdu Chemical Co., Ltd. Tokasei Co., Ltd. product name YDCN-703) 10 parts by weight. As a curing agent for the epoxy resin, 27 parts by weight of phenol novolac resin (trade name Praio-Fen LF2882 manufactured by Dainippon Inki Chemical Industry Co., Ltd.) was used. Epoxy group-containing acrylic copolymer, using epoxy group-containing acrylic rubber (weight-average molecular weight of 800,000 by gel permeation chromatography, glycidyl methacrylate is 3% by weight, Tg is -7°C , Nagase ChemTex Co., Ltd. product name HTR-860P-3DR) 28 parts by weight. As the curing accelerator, 0.1 parts by weight of an imidazole-based curing accelerator (Kyuazol 2PZ-CN manufactured by Shikoku Chemical Industry Co., Ltd. was used) was used. Silica filler is used (made by Admafine ...
Embodiment 2
[0104] HS-230 (thickness: 10 μm) was used for the first adhesive layer, and the same adhesive sheet as in the first example was used for the second adhesive layer and laminated at 60°C to form a first and second adhesive layer. Multilayer adhesive sheet. As a result of measuring the amount of flow in the state where the first adhesive layer and the second adhesive layer were bonded, the first adhesive layer was 200 μm, and the second adhesive layer was 758 μm.
[0105] The multilayer adhesive sheet was bonded to the semiconductor wafer A (thickness 80 μm) to be processed at 60° C. in such a way that the first adhesive layer was in contact with the semiconductor wafer A (thickness 80 μm) to be processed, and then cut Ends. Next, the dicing tape 1 was prepared so that the second adhesive layer b was laminated on the dicing tape 1, and then a laminate was formed at 25° C. with a heated calender roll laminator (Riston manufactured by Du Pont). Figure 4 ). In this case, the dic...
Embodiment 3
[0107] In this embodiment, the same adhesive sheet as in Example 1 was produced, except for a film thickness of 50 μm.
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| particle size | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 