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Mach-Zehnder shear wave surface measuring system and measuring method thereof

A shear wave, surface measurement technology, applied in measurement devices, measurement optics, optical radiation measurement, etc., can solve the problems of unable to recover wave surface, no guarantee of debugging accuracy, etc.

Inactive Publication Date: 2010-01-27
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, only the information of the height of the wave surface can be calculated, and the wave surface cannot be restored for computer digital processing.
At the same time, there is no guarantee of debugging accuracy

Method used

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  • Mach-Zehnder shear wave surface measuring system and measuring method thereof
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  • Mach-Zehnder shear wave surface measuring system and measuring method thereof

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Embodiment Construction

[0038] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0039] see first figure 1 , figure 1 It is a structural schematic diagram of the device of the present invention. As can be seen from the figure, the Mach-Zehnder type shear wave surface measurement system of the present invention includes: an incident plate 1, an exit plate 2, a fixed base 23, a first reflective plate 3, a second reflective plate 4, a third reflective plate 5, the first An interference system composed of four reflective plates 6, a first guide rail 7, a second guide rail 8, an imaging lens 9, a small hole 10 and a CCD imager 11;

[0040] The adjustment equipment that provides precision assurance includes a self-collimating collimator 12, a first reflector 13, a laser collimated light source 14, a reference transflector 15, a second reflector 16, an apert...

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Abstract

The invention relates to a Mach-Zundel type shearing waveform measuring system and a shearing waveform measuring method thereof. The system comprises an interference system consisting of an incident panel, an emission panel, a fixed seat, a first reflecting panel, a second reflecting panel, a third reflecting panel, a fourth reflecting panel, a first guide rail, a second guide rail, an imaging lens, an aperture and a CCD imaging instrument. An adjusting device for ensuring accuracy comprises an auto-collimation collimator tube, a first reflecting mirror, a laser collimating light source, a reference transmitting and reflecting mirror, a second reflecting mirror, a lens screen, a first pentaprism, and a second pentaprism. A control processing system comprises a piezo-electric controller and a computer processing system. The system and the method are suitable for measuring waveform with large aperture and under a diffraction limit, and particularly suitable for being used on a light source waveform with short coherent length. The system and the method can conduct dephasing processing, and are provided with an entire system for real-time adjustment and calibration.

Description

technical field [0001] The invention relates to the measurement of laser wave fronts, in particular to a Mach-Zehnder type shear wave front measurement system and a shear wave front measurement method thereof. Background technique [0002] The optical diffraction limit is the minimum divergence that can be achieved when the beam is limited by the aperture. At this time, the wavefront of the beam only has a wavefront aberration of about 0.3λ. The shearing interferometry is a convenient and precise indirect measurement method. The rate of change of the wave surface is obtained through the interference between the wave surface to be measured and its own copy surface. The prior art can measure such tiny wave difference conveniently and intuitively by using double shear interference. The phase-shifting method in interferometry is a commonly used method to improve the measurement accuracy. For the double-shear interferometry system, if the phase-shifting method is introduced, int...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J9/02
Inventor 栾竹刘立人王利娟
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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