Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

A grayscale mask and a manufacturing method technology, which are applied in the photoengraving process of the pattern surface, the original for optical mechanical processing, optics, etc. and other problems, to achieve the effects of reduced manufacturing cost, good processability, and good pattern shape

Inactive Publication Date: 2007-10-24
ULVAC COATING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0028] As in the above-mentioned patent documents, various structures and manufacturing methods have been proposed for the grayscale mask, each of which uses a high-cost process. In addition, since it is difficult to ensure the in-plane uniformity of the semi-transparent part, in There are problems with the shape of the pattern and the shape of the cross section of the pattern, so it is difficult to implement

Method used

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  • Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
  • Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
  • Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0112] Use on transparent substrates containing NiMo18 atomic % and Ti27 atomic %, NiMo21 atomic % and Ti17 atomic %, NiMo22 atomic % and Ti15 atomic %, NiMo22 atomic % and Ti12 atomic %, NiMo18 atomic % and Ti12 atomic %, NiMo23 atomic % And Ti10 atomic %, NiMo23 atomic % and Ti9 atomic %, NiMo15 atomic % and Al20 atomic %, NiMo25 atomic %, NiMo7 atomic % sintered body target, and pure Cr target, in a vacuum chamber with a specified atmosphere gas, through direct current A light-shielding film and a light-transmitting film are formed by sputtering.

[0113] The transparent substrate uses a quartz plate with a thickness of 5.0mm or a blue plate glass with a thickness of 4.8mm. During film formation, the transparent substrate is heated by a quartz heater installed in a vacuum chamber to reach a temperature of 120-200°C. In the vacuum chamber, as the atmosphere gas, only Ar gas is used to fabricate metal NiMoTi film, metal NiMoAl film, metal NiMo film, and metal Cr film. In addi...

Embodiment 2

[0122] Based on the results obtained in Example 1, a grayscale mask was actually fabricated. As the film composition, as shown in Table 2, under the same film-forming conditions as in Example 1, a two-layer film of the following composition was produced: the light-shielding film was a NiMo22Ti15 film, and the semi-transparent film was a Cr film (NO.18). The film composition of the grayscale mask blank, the light-shielding film is NiMo22Ti15 film, the semi-transparent film is CrOx film (NO.19) The film composition of the gray-scale mask blank, the light-shielding film is NiMo15Al20 film, the semi-transparent film is CrOx film (NO.21) gray-scale mask blank film composition, the light-shielding film is a NiMo25 film, the semi-transparent film is a film composition of a gray-scale mask blank CrOx film (NO.22); further as a Cr element-free The film composition of the gray scale mask blank, the light-shielding film is NiMo22Ti15 film, the semi-transparent film is NiMo15Al20 film (NO...

Embodiment 3

[0127] An anti-reflection film was formed on the light-shielding film of grayscale mask blank No. 19 in Example 2 to prepare grayscale mask blank No. 20. The film formation conditions and the etching process for the grayscale mask were performed under the same conditions as in Example 2. Anti-reflective coating using Ar gas and CO 2 The gas is formed by the reactive sputtering method, and the film formation on the light-shielding film and the anti-reflection film is performed by the same film forming machine at one time. Table 2 shows the results of measuring the reflectance on the film surface side of the obtained gray scale mask blank. In addition, the transmittance after film formation of the semi-transparent film was measured, the measurement of the optical density OD of the two-layer film after film formation, the cross-sectional shape of the opening after patterning using the first etchant, and the use of The measurement of the transmittance of the semi-transparent por...

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Abstract

This invention provides blanks for a gray tone mask, having a pattern comprising a light shielding part, an opening, and a semi-light-transparent part. A light shielding film and a semi-light-transparent film are adhered directly or indirectly on a surface of a transparent substrate. The light shielding film and the semi-light-transparent film are different from each other in the composition of the metal component in the light shielding film and the semi-light-transparent film. There is also provided a process for producing a gray tone mask, comprising etching a light shielding film and a semi-light-transparent film with a first etching liquid, which can etch the light shielding film and the semi-light-transparent film at the same etching rate, and conducting half-etching with a second etching liquid which can selectively etch only the light shielding film without etching the semi-light-transparent film.

Description

technical field [0001] The present invention relates to a blank for a grayscale mask used in the manufacture of a liquid crystal color display device, a grayscale mask using the blank, and a method for manufacturing the blank. Background technique [0002] In recent years, in the manufacture of thin film transistor liquid crystal display devices (TFT-LCD), development of technology for cost reduction has been carried out. In the color filter manufacturing process, instead of using the high-cost photolithography process, it is proposed to try to make it through the low-cost inkjet method. In the TFT substrate manufacturing process, a grayscale mask is used to reduce the TFT channel part. It is a proposal to reduce the number of masks used in the formation process, the ion implantation process, etc., and the photolithography process (see Patent Document 1). [0003] A photomask called a grayscale mask is different from a normal photomask in that two or more types of exposure ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/08G02F1/1335G03F1/00G03F1/80
CPCG03F1/80G03F1/144G03F1/50G02F1/1335G03F1/32G03F1/54
Inventor 山田文彦尾崎俊治平元豪
Owner ULVAC COATING
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