Making method for non image element remote infrared upper transformation imaging device with reflector
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI JIAO TONG UNIV
- Publication Date
- 2007-11-28
- Estimated Expiration
- Not applicable · inactive patent
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to a method in the technical field of semiconductor photodetection, in particular to a method for manufacturing a pixelless far-infrared up-conversion imaging device with a mirror. Background technique
[0002] Far-infrared detection imaging has broad application prospects in astrophysics, biomedicine, and new material exploration. Due to technical difficulties in far-infrared imaging, expensive far-infrared detectors, and complex readout circuits, far-infrared detection imaging is only used for special purposes. Through the integrated structure of the low-cost gallium arsenide homojunction far-infrared detector and the gallium arsenide and aluminum gallium arsenide light-emitting diode, under the far-infrared light radiation, the resistance of the detector decreases, causing the voltage on the light-emitting diode to increase, making the light emitting diode The diode emits near-infrared light that can be detected by a silicon c...